Jmar Research, Inc.

USA As Represented by Secretary of the Navy

Imar Technology Company

Gatan, Inc.

Sparta, Inc.

Jmar LLC

Jamar Technologies Co.

Jamar Technology Co

Tamar Technology Co.

Harry Rieger

Richard M Foster

Henry Shields

James H Morris

Michael Powers

James J Alwan

Scott Harris Bloom

I C Edmond Turcu

Jose M Sasian

Andrew Stone

Edmond Turcu

Serge Cambeau

A sample analysis system comprises a laser unit and a spectrometer unit. The laser unit emits a first laser pulse and a second laser pulse towards the sample with a pulse separation time of between about 1 microsecond to 20 microseconds. The laser unit includes an oscillator unit which is configured to generate the first laser pulse and the second laser pulse. A pre-amplifier unit is configured to receive the first laser pulse and the second laser pulse and increase the energy levels of each pulse prior to the pulses being emitted from the laser unit. The spectrometer unit captures emissions generated by the sample after the sample is stuck by the first and second laser pulses and identifies the elemental constituents of the sample using the emissions.

Multipulse agile laser source for real time spark spectrochemical hazard analysis

Disclosed herein are systems and methods for advancing tape/ribbon through a targeting area where laser ablation of the tape occurs in laser produced plasma equipment. Disclosed systems include a first positioning surface perpendicular to further positioning devices, where all of the positioning components work to precisely position the advancing tape in the point source area. After the first positioning device, the remaining positioning surfaces are parallel and provide positioning forces on the tape along a single horizontal axis, but in alternately opposing directions. Such forces assist to precisely position the tape in the desired target location, and to control the rate of advancement of the tape by imparting friction on the tape in alternating, opposing directions. A steady drive roller serves to pull the tape through the system, and works in conjunction with the friction imparted by the positioning surfaces to advance the tape at a substantially constant velocity.

Systems and methods for tape advancement in laser produced plasma equipment

A laser produced plasma device comprises a shutter assembly for mitigating the contaminating effects of debris generated by the plasma. In one embodiment, the shutter assembly includes a rotatable shutter having at least one aperture that provides a line-of-sight between a radiation source and an exit of the device during a first period of rotation of the shutter, and obstructs the line-of-sight between the radiation source and the exit during a second period of rotation. The shutter assembly in this embodiment also includes a motor configured to rotate the shutter to permit passage of the X-rays through the at least one aperture during the first period of rotation, and to thereafter rotate the shutter to obstruct passage of the debris through the at least one aperture during the second period of rotation.

Rotating shutter for laser-produced plasma debris mitigation

The present application describes a system and method for providing a pulse laser may include a first reflector, a second reflector, a lasing module and a fast optical valve. The first reflector and the second reflector may form an optical cavity. The lasing module may be disposed at least partly in the optical cavity. A fast optical valve may be disposed at least partly within the optical cavity and structured to block and to allow lasing within the optical cavity. The fast optical valve may also be structured to output a laser pulse that has a pulse duration of approximately a round trip time of the optical cavity. By placing at least part of the first reflector or the second reflector on a moving element, the pulse duration of the outputted laser pulse can be manipulated easily.

Method and system for providing a pulse laser

Systems and methods are provided for achieving high power and high intensity laser amplification. In a four-pass optical amplifying system, a linear polarized optical beam is directed by various optical elements four times through an optical amplifier. The optical amplifier is transversely pumped by a pumping energy source that includes laser diode arrays. The pumping module and the other optical components are provided to counteract thermal lensing effects, induced thermal birefringence effects and to achieve enhanced amplification and efficiencies.

High intensity and high power solid state laser amplifying system and method

A method and apparatus for generating membrane targets for a laser induced plasma is disclosed herein. Membranes are advantageous targets for laser induced plasma because they are very thin and can be readily illuminated by high-power coherent light, such as a laser, and converted into plasma. Membranes are also advantageous because illumination of the membrane with coherent light produces less debris and splashing than illumination of a thicker, solid target. Spherical membranes possess additional advantages in that they can be readily illuminated from variety of directions and because they can be easily placed (i.e. blown) into a target region for illumination by coherent light. Membranes are also advantageous because they can be formed from a liquid or molten phase of the target material. According to another embodiment, membranes can be formed from a solution in which the target materials are solvated. Membranes can be formed an a variety of ways, such as by rotating a circular apparatus through a reservoir of liquid target material such that membranes form across apertures that are disposed in the circular apparatus. Spherical membranes can also be formed by applying a gas (i.e. blowing) against a membrane formed in an aperture of a circular apparatus.

Method and apparatus for generating a membrane target for laser produced plasma

A method and apparatus for laser cutting a target material is disclosed. The method includes the steps of generating laser pulses from a laser system and applying the laser pulses to the target material so that the laser pulses cut through the material. The laser pulses have an approximately ellipse shaped spot, have a temporal pulse width shorter than about 100 nanoseconds, and have an energy density from about 2 to about 20 times the ablation threshold energy of the target material. The laser pulses are applied to the material such that the major axis of the ellipse shaped spot moves parallel to the cutting direction. The spot has a leading edge and a trailing edge on the major axis, and the energy density of each laser pulse increases from zero to a maximum along the leading edge and decreases back to zero along the trailing edge. The apparatus is a laser system for cutting a target material that includes: a seed laser system for producing a first pulse laser beam; a laser amplifier for amplifying the first pulse laser beam to produce an amplified pulse laser beam; a harmonic generation system for converting the amplified pulse laser beam into a second pulse laser beam having a shorter wavelength; a focussing system for focussing the second pulse laser beam to an approximately ellipse shaped third pulse laser beam; and a motion control system for moving a target material contacted by the third pulse laser beam.

Method and apparatus for laser ablation of a target material

A shaped plasma discharge system is provided in which a shaped radiation source emits radiation at a desired frequency and in a desired shape. In one embodiment, a laser source provides an output beam at a desired intensity level to shaping optics. The shaping optics alters the output beam into a desired shaped illumination field. In an alternate embodiment, plural laser sources provide plural output beams and the shaping optics can produce a compound illumination field. The illumination field strikes a target material forming a plasma of the desired shape that emits radiation with a desired spatial distribution, at a desired wavelength, preferably in the x-ray, soft x-ray, extreme ultraviolet or ultraviolet spectra. In another embodiment an electric discharge generates the required shaped radiation field. The shaped emitted radiation proceeds through an optical system to a photoresist coated wafer, imprinting a pattern on the wafer.

Shaped source of soft x-ray, extreme ultraviolet and ultraviolet radiation

A laser system which generates short duration pulses, such as under five nanoseconds at an energy level of up to a few milli-Joules per pulse (mJ/p) with near diffraction limited beam quality. A laser crystal is pumped (excited) by diode lasers. A resonator having at least two mirror surfaces defines a beam path passing through the laser crystal. The beam path in the resonator is periodically blocked by a first optical shutter permitting pump energy to build up in the laser crystal, except for a short period near the end of each pumping period. While the first optical shutter is open a second optical shutter blocks the light in the resonator except for periodic short intervals, the intervals being spaced such that at least one light pulse traveling at the speed of light in the resonator is able to make a plurality of transits through the resonator, increasing in intensity by extracting energy from the excited laser crystal on each transit. After the light pulse has built up in intensity, an optical release mechanism releases the pulse from resonator.

Short pulse laser system

A high average power, high brightness solid state laser system. We first produce a seed laser beam with a short pulse duration. A laser amplifier amplifies the seed beam to produce an amplified pulse laser beam which is tightly focused to produce pulses with brightness levels in excess of 10.sup.11 Watts/cm.sup.2. Preferred embodiments produce an amplified pulse laser beam having an average power in the range of 1 kW, an average pulse frequency of 12,000 pulses per second with pulses having brightness levels in excess of 10.sup.14 Watts/cm.sup.2 at a 20 .mu.m diameter spot which may be steered rapidly to simulate a larger spot size. Alternately, a kHz system with several (for example, seven) beams (from amplifiers arranged in parallel) can each be focused to 20 .mu.m and clustered to create effective spot sizes of 100 to 200 .mu.m. These beams are useful in producing X-ray sources for lithography.

Low cost, high average power, high brightness solid state laser

A laser system which generates pulses with a duration in the range of about 60 to 300 ps at an energy level of up to a few milli-Joules per pulse (mJ/p) with near diffraction limited beam quality. A laser crystal is pumped (excited) by diode lasers. A resonator having at least two mirror surfaces defines a beam path passing through the laser crystal. The beam path in the resonator is periodically blocked by a first optical shutter permitting pump energy to build up in the laser crystal, except for a short period near the end of each pumping period. While the first optical shutter is open a second optical shutter blocks the light in the resonator except for periodic subnano-second intervals, the intervals being spaced such that at least one light pulse traveling at the speed of light in the resonator is able to make a plurality of transits through the resonator, increasing in intensity by extracting energy from the excited laser crystal on each transit. After the light pulse has built up in intensity, an optical release mechanism releases the pulse from resonator.

Picosecond laser

A efficient point source x-ray target tape assemble. A tape is wrapped helically around a rotating drum a little more than one complete turn so as to create an overlap section where a section of the tape is positioned parallel and adjacent to a separate section of the tape. The tape advances slowly across the outside surface of the drum at a speed which is a small fraction of the tangential surface speed of said drum. In a preferred embodiment a pulsed laser beam is focused on the tape at a fixed spot in space through which the tape moves in order to create x-rays from plasma generated by very high intensity ablation of the tape material. The combination of the drum rotation and the tape advancement across the surface of the drum permits substantially full utilization of the tape material for generation of x-rays.

X-ray target tape system

A high average power, high brightness solid state laser system. We first produce seed laser beam with a short pulse duration and frequency in excess of 1,000 pulses per second. A laser amplifier amplifies the seed pulse beam to produce an amplified pulse laser beam which is focused to produce pulses with brightness levels in excess of 10.sup.11 Watts/cm.sup.2. Preferred embodiments produce an amplified pulse laser beam having an average power in the range of 1 kW, an average pulse frequency of 12,000 pulses per second with pulses having brightness levels in excess of 10.sup.14 Watts/cm.sup.2 at a 20 .mu.m diameter spot which is steered rapidly to simulate a larger spot size. These beams are useful in producing X-ray sources for lithography. In one preferred embodiment, the seed beam is produced in a mode locked Nd:YAG oscillator pumped by a diode array with the frequency of the pulses being reduced by an electro-optic modulator. In a second preferred embodiment, the seed beam is Q switched and includes a Pockels cell for cavity dumping. In a third preferred embodiment, the short duration high frequency pulses for the seed beam is produced by a very short Nd:YAG crystal and a .lambda./2 Pockels cell. As compared with prior art high brightness lasers, we have achieved our very high brightness by reducing the pulse duration by about 2 or 3 orders of magnitude, from a few ns to 100 ps or less and by focusing on a very small spot, but we are able to simulate a much larger spot by very rapidly steering our high average power beam over the area we need.

A high average power, high brightness solid state laser system. A laser produces a first pulse laser beam with a high pulse frequency. A pulse spacing selector removes from the first pulse laser beam more than 80 percent of the pulses to produce a second pulse laser beam having a series of periodically spaced short pulses in excess of 1,000 pulses per second. A laser amplifier amplifies the second pulse train to produce an amplified pulse laser beam which is focused to produce pulses with brightness levels in excess of 10.sup.11 Watts/cm.sup.2. A preferred embodiment produces an amplified pulse laser beam having an average power in the range of 1 KW, an average pulse frequency of 12,000 pulses per second with pulses having brightness levels in excess of 10.sup.14 Watts/cm.sup.2 at a 20 .mu.m diameter spot which is steered rapidly to simulate a larger spot size. These beams are useful in producing X-ray sources for lithography. As compared with prior art high brightness lasers, we have reduced the pulse duration by about 2 or 3 orders of magnitude, from a few ns to 100 ps or less. We achieve our very high brightness by focusing on a very small spot, but we are able to simulate a much larger spot by very rapidly steering our high average power beam over the area we need.

Growing community of inventors

San Diego, CA, United States of America

Harry Rieger