Leybold Optics Gmbh

Leybold Systems Gmbh

BÜhler Alzenau Gmbh

Balzers Leybold Optics Gmbh

Harro Hagedorn

Michael Scherer

Jurgen Pistner

Alfons Zoller

Gerd Deppisch

Mario Roder

Walter Lehnert

Eckhard Wirth

Hans-Georg Lotz

Hermann Kloberdanz

Werner Klug

G&uuml;nter Br&auml;uer

Werner Weinrich

Michael K&ouml;nig

Rudolf Beckman

Jochen Schneider

Tobias Gross

Alfons Z&ouml;ller

J&uuml;rgen Meinel

G&ouml;tz Teschner

Jürgen Pistner

Michael Klosch-Trageser

Alfons Zöller

Mario Röder

Torsten Dieter

Alfons ZÖLLER

Walter Lehrnert

The invention relates to a method for producing substrates having a plasma coated surface made of a dielectric coating material in a vacuum chamber, having an AC-powered plasma device, comprising moving a substrate relative to the plasma device by means of a movement device along a curve, and depositing coating material on a surface of the substrate in a coating region along a trajectory lying on the surface of the substrate using the plasma device.

Method for producing coated substrates

A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

Method for producing a multilayer coating and device for carrying out said method

A test glass changer for optically measuring layer properties in a vacuum coating system including a movable substrate holder for guiding a substrate through a stream of coating material; a mount connected to a rotary spindle and rotatable relative to the substrate holder about the rotary spindle; and a control device directing a test glass element into a ray path of an optical measuring device and into a stream of the coating material. The mount has at least two recesses offset eccentrically with respect to the spindle for one test glass element in each case. The control device can induce a rotational movement of the mount about the spindle. The centering device can exert a torque and holding moment on the mount to bring a test glass element arranged in one of the recesses into a measuring position of the measuring device. Related methods are also provided.

Test glass changing

The invention relates to an apparatus () for producing a reflection-reducing layer on a surface () of a plastics substrate (). The apparatus comprises a first sputtering device () for applying a base layer () to the surface () of the plastics substrate (), a plasma source () for plasma-etching the coated substrate surface (), and a second sputtering device () for applying a protective layer () to the substrate surface (). These processing devices () are arranged jointly in a vacuum chamber (), which has inlets () for processing gases. In order to move the substrate () between the processing devices () in the interior of the vacuum chamber (), a conveying apparatus () is provided which is preferably in the form of a rotary table (). Furthermore, the invention relates to a method for producing such a reflection-reducing layer on the surface () of the plastics substrate ().

Method and apparatus for producing a reflection-reducing layer on a substrate

The invention concerns a measuring system for optical monitoring of coating processes in a vacuum chamber, in which the light source is arranged inside the vacuum chamber between the substrate carrier and a shutter is arranged beneath the substrate carrier and the light-receiving unit is arranged outside the vacuum chamber in the optical path of the light source. The substrate carrier is designed to accept at least one substrate, and it can move across the coasting source in the vacuum chamber, preferably revolving about an axis, whereby the substrate or substrates cross(es) the optical path between the light source and the light-receiving unit for transmission measurement, and the shutter shades a measurement area across the coating source.

Measuring system for optical monitoring of coating processes

Process for continuous determination of the optical layer thickness of coatings, which are applied on both sides of the spherical surfaces of concave convex lenses having different spherical radii R and R . In this process a ray of light is beamed eccentrically during the coating process at each concave convex lens, and the reflection or transmission at the convex spherical surface and at the concave spherical surface is continuously measured with photodiodes, and the respective optical layer thickness is determined from the functional relationship between the reflection or the transmission and the optical layer thickness.

Process for continuous determination of the optical layer thickness of coatings

In an apparatus for the coating of substrates in a vacuum with rotatable substrate carriers (,) and with a loading and an unloading station (,or,), two vacuum chambers (,) are provided with several coating stations (,or,to,), directly next to one another, wherein a rotatable transport arm (,or,) is accommodated in each of the two chambers (,), and the transport planes of the two transport arms (,) are aligned with one another. In the separation area of the two chambers (,), an air lock is provided with a corresponding transfer apparatus (,) with two transport arms (,), whose rotary plate (,) is provided with substrate storage unit (,) and projects about halfway into one chamber (,) and halfway into the other chamber (,), wherein one chamber (,) has both the loading as well as the unloading station (,or,).

Apparatus for the coating of substrates in a vacuum chamber

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Frankfurt-am-Main, Germany

Harro Hagedorn