Asml Netherlands B.v.

Harold Sebastiaan Buddenberg

Giovanni Luca Gattobigio

Theodorus Wilhelmus Polet

Gheorghe Tanasa

Floor Lodewijk Keukens

Daan Daniel Johannes Antonius Van Sommeren

Nicolaas Ten Kate

Cornelius Maria Rops

Rogier Hendrikus Magdalena Cortie

Koen Cuypers

Mark Johannes Hermanus Frencken

Evert Van Vliet

Pepijn Van Den Eijnden

Marcel Maria Cornelius Franciscus Teunissen

Jantien Laura Van Erve

Erik Henricus Egidius Catharina Eummelen

Yuri Johannes Gabriël Van De Vijver

Ferdy Migchelbrink

Arnoldus Johannes Martinus Jozeph Ras

Jimmy Matheus Wilhelmus Van De Winkel

Günes Nakiboglu

Coen Hubertus Matheus Baltis

Jorge Alberto Vieyra Salas

Miao Yu

Aleksandar Nikolov Zdravkov

Jeroen Arnoldus Leonardus Johannes Raaymakers

Walter Theodorus Matheus Stals

Petrus Martinus Gerardus Johannes Arts

Marijn Wouters

Josephus Peter Van Lieshout

Seerwan Saeed

Johannes Cornelis Paulus Melman

Johannes Cornelius Paulus Melman

A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

Fluid handling structure for lithographic apparatus

An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

Inspection substrate and an inspection method

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, a lithographic apparatus and a method of operating a lithographic apparatus

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, lithographic apparatus and method of operating a lithographic apparatus

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Sittard, Netherlands

Harold Sebastiaan Buddenberg