Asml Netherlands B.v.

Asm Lithography B.v.

Harmen Klaas Van Der Schoot

Erik Roelof Loopstra

Hernes Jacobs

Petrus Matthijs Henricus Vosters

Bernardus Antonius Johannes Luttikhuis

Henrikus Herman Marie Cox

Sven Antoin Johan Hol

Vadim Yevgenyevich Banine

Hans Butler

Andrei Mikhailovich Yakunin

Lucas Henricus Johannes Stevens

Maarten Van Kampen

Fransicus Mathijs Jacobs

Joost Jeroen Ottens

Nicolaas Rudolf Kemper

Engelbertus Antonius Fransiscus Van Der Pasch

Koen Jacobus Johannes Maria Zaal

Gerjan P Veldhuis

Robert Johannes Petrus Van Diesen

Frits Van Der Meulen

Marc Wilhelmus Maria Van Der Wijst

Jan Van Eijk

Boris Menchtchikov

Edwin Johan Buis

Willem Jurrianus Venema

Noud Jan Gilissen

Jeroen Pieter Starreveld

Sebastiaan Maria Johannes Cornelissen

Patricia Vreugdewater

Martinus Arnoldus Henricus Terken

Rob Jansen

Aart Adrianus Van Beuzekom

Wouterus Johannes Petrus Maria Maas

Johannes Martinus Andreas Hazenberg

Michel Pieter Dansberg

Gerrit Maarten Bonnema

Christiaan Alexander Hoogendam

Patricius Aloysius Jacobus Tinnemans

Arno Jan Bleeker

Joeri Lof

Raymond Wilhelmus Louis Lafarre

Yim-Bun Patrick Kwan

Cheng-Qun Gui

Theodorus Petrus Maria Cadee

Emiel Jozef Melanie Eussen

Jozef Petrus Henricus Benschop

David Ferdinand Vles

Adrianus Hendrik Koevoets

Gosse Charles De Vries

Ruud Antonius Catharina Maria Beerens

Robert-Han Munnig Schmidt

Cornelius Adrianus Lambertus De Hoon

Jim Vincent Overkamp

Sander Catharina Reinier Derks

Marcus Martinus Petrus Adrianus Vermeulen

Bernardus Antonius Slaghekke

Marcel Koenraad Marie Baggen

Adrianus Gerardus Bouwer

Martinus Agnes Willem Cuijpers

Youssef Karel Maria De Vos

Willem Herman Gertruda Anna Koenen

Wilhelmus Henricus Theodorus Maria Aangenent

Koos Van Berkel

Raimond Visser

Pieter Renaat Maria Hennus

Petrus Theodorus Rutgers

Christiaan Louis Valentin

Ronald Casper Kunst

Hendrikus Herman Marie Cox

Jacobus Cornelis Gerardus Van Der Sanden

Niels Johannes Maria Bosch

Krijn Frederik Bustraan

Arjan Franklin Bakker

Olof Martinus Josephus Fischer

Angelo Cesar Peter De Klerk

Stan Henricus Van Der Meulen

Alain Louis Claude Leroux

Erik Johan Arlemark

Martinus Hendricus Henricus Hoeks

Ton De Groot

Ronald Cornelis Gerardus Gijzen

Arjan Martin Van Der Wel

Patrick Willem Paul Limpens

Dries Vaast Paul Hemschoote

Godfried Katharina Hubertus Franciscus Geelen

Joost De Hoogh

David William Callan

Martin Dieter Nico Peters

Paul Comé Henri De Wit

Bartholomeus Hendricus Koek

Robert-Han Munnig-Schmidt

Petrus M H Vosters

Koen J J M Zaal

Peter Rutgers

Evert Auke Rinze Westerhuis

Piet Vosters

Angelo Oscar Peter De Klerk

Henricus W A Janssen

Joost Kauffman

Martijn Hendrikus Wilhelmus Stopel

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Lithographic apparatus

A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

Graphene spectral purity filter

A sensor system configured to determine a position of a substrate having an edge. The sensor system includes a radiation source arranged to emit a radiation bundle, a reflective element, a detector device and a substrate table having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.

Sensor system, substrate handling system and lithographic apparatus

Pellicle for reticle and multilayer mirror

An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.

Lithographic apparatus and method

A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.

Lithographic apparatus and method for correcting a position of a stage of a lithographic apparatus

A substrate handler is provided. The substrate handler includes a support surface configured to carry a substrate and a pre-conditioning unit configured to pre-condition the substrate. The substrate handler is configured to move the substrate relative to a substrate table.

Lithographic apparatus and device manufacturing method utilizing a substrate handler

The invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a transmissive patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the patterning device support is configured to hold a patterning device and wherein the lithographic apparatus includes a clamping device, the clamping device being configured to clamp the patterning device at the top side.

Lithographic apparatus and device manufacturing method for clamping a patterning device

An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide a patterned radiation beam, where the projection system projects the patterned radiation beam onto a target portion of a conditioned substrate.

Substrate handler, lithographic apparatus and device manufacturing method

An immersion lithographic projection apparatus includes a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with an element of the projection system during substrate swap. The shutter member is connected to a metrology frame which also supports the projection system. In this way the position of the shutter member is always known.

An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.

Apparatus configured to position a workpiece

A lithographic apparatus includes a support constructed to support a patterning device. The patterning device is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The support includes a force actuator device to exert a force onto the patterning device in a direction of movement of the support. The force actuator device includes a movable part which is pivotably about a pivot axis and thereby connected to the support. The movable part is in the direction of movement of the support substantially balanced with respect to the pivot axis. The force actuator device further includes an actuator to exert via the movable part the force onto the patterning device, to at least partly compensate for the information or a risk of slippage due to acceleration of the support in the direction of movement.

Lithographic apparatus and stage apparatus

A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.

Growing community of inventors

Vught, Netherlands

Harmen Klaas Van Der Schoot