Asml Netherlands B.v.

Harm-Jan Voorma

Vadim Yevgenyevich Banine

Carolus Ida Maria Antonius Spee

Alexander Matthijs Struycken

Vladimir Vitalevitch Ivanov

Klaas Timmer

Josephus Jacobus Smits

Lambertus Adrianus Van Den Wildenberg

Johannes Bernardus Ridder

Johannes Hubertus Josephina Moors

Antonius Johannes Josephus Van Dijsseldonk

Vladimir Mihailovitch Krivtsun

Uwe Mickan

Maarten Marinus Johannes Wilhelmus Van Herpen

Arno Jan Bleeker

Marcel Mathijs Theodore Marie Dierichs

Derk Jan Wilfred Klunder

Markus Franciscus Antonius Eurlings

Wilhelmus Josephus Box

Mark Kroon

Olav Waldemar Vladimir Frijns

Vladimir Mikhailovich Krivtsun

Johannes Adrianus Antonius Theodorus Dams

Johannes Christiaan Leonardus Franken

Erik Petrus Buurman

Mandeep Singh

Ramon Mark Hofstra

Sumant Sukdew Ramanujan Oemrawsingh

Maurice Piërre Marie Arthur Limpens

Peter Frans Maria Muys

JHJ Moors

JCL Franken

A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.

Radiation source

A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

Ex-situ removal of deposition on an optical element

A method of preparing components for use in a vacuum chamber of a lithographic apparatus is disclosed. The method includes coating the component with a non-metallic material. The method may further include treating the coating so as to harden the coating. Preferably, the coating material is a hydrogen silsesquioxane (HSQ), which may be applied via spraying, brushing, or spinning and can be treated by heating or by irradiation with an electron beam. The resulting components strongly reduce outgassing of water and hydrocarbons when subjected to a vacuum environment.

Method of preparing components, prepared component, lithographic apparatus and device manufacturing method

An EUV illumination system, for example, for use in a photolithographic apparatus is configured to condition a radiation beam. A hydrogen radical source configured to supply gas containing hydrogen or hydrogen radicals into the illumination system. The hydrogen gas is effective to remove carbonaceous contamination from the surface of a mirror in the illumination system or to form a buffer against unwanted gases. In order to prevent damage by hydrogen that penetrates the mirror, the mirror comprises a layer made of metal non-metal compound adjacent a reflection surface of the mirror. A transition metal carbide, nitride, boride or silicide compound or mixture thereof may be used for example.

Illumination system, lithographic apparatus, mirror, method of removing contamination from a mirror and device manufacturing method

A collector is disclosed that is constructed to receive radiation from a radiation source and to transmit radiation to an illumination system, the collector comprising a reflective element which is internally provided with a fluid channel.

Lithographic apparatus, device manufacturing method and radiation collector

A lithographic apparatus includes an illumination system for providing a projection beam of radiation, a support structure for supporting patterning structure for imparting a pattern to the projection beam, a substrate table for holding a wafer and a projection system for projecting the patterned beam onto a target portion of the wafer. In order to permit control of the radiation dose at the wafer so that the throughput of wafers can be optimised, a variable attenuator is provided to vary the intensity of the projection beam while not changing the position of the beam. The variable attenuator includes two parallel mirrors positioned such that an input beam of radiation is incident on a first of the mirrors by which it is reflected towards a second of the mirrors by which the beam is reflected to produce an output beam of radiation of required intensity for input to the illumination system, and a tilting mechanism for tilting the mirrors such that the mirrors remain parallel to one another and the angles of incidence of the beams on the mirrors are changed so as to vary the intensity of the output beam. This allows the intensity of the projection beam to be varied continuously without changing the position of the beam, whether the input beam is converging, diverging or parallel.

Lithographic apparatus, device manufacturing method and variable attenuator

A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. The apparatus further includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a collector which is arranged for transmitting radiation, received from a first radiation source, to the illumination system. The apparatus includes at least a heater for heating the collector when the collector receives substantially no radiation from the first radiation source. Further aspects of the invention relate to a device manufacturing method as well as a device manufactured thereby.

Lithographic apparatus, device manufacturing method, and device manufactured thereby

A lithographic apparatus including a radiation attenuator or a variable aperture system, such as masking blades, arranged in or adjacent an intermediate focus of the projection system. Besides a radiation attenuator or a variable aperture system, a measuring system may be arranged in the intermediate focus. By placing one or more of such systems in or adjacent the intermediate focus of the projection system, instead of adjacent the reticle in the illumination system, fewer design restrictions occur because of more space available, resulting in a lower design cost.

Lithographic apparatus and device manufacturing method

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Zaltbommel, Netherlands

Harm-Jan Voorma