Th. Goldschmidt Ag

Goldschmidt Ag

Evonik Degussa Gmbh

Evonik Operations Gmbh

Evonik Goldschmidt Corporation

Hardi Döhler

Wilfried Knott

Michael Ferenz

Christian Weitemeyer

Horst Dudzik

Frauke Henning

Sascha Herrwerth

Joachim Venzmer

Dietmar Wewers

Sascha Oestreich

Jurgen Jachmann

Christian Mund

Philipp Tomuschat

Sadik Amajjahe

Thomas Neumann

Mike Brand

Gabriele Platte

Winfried Hamann

Andreas Landgraf

Jutta Esselborn

Florian Gaber

Jürgen Pomorin

Irem Karabulut

Juergen Pomorin

Dieter Grauer

Ingo SCHÖNEMANN

Matthias Naumann

An organosiloxane which has at least one aromatic radical can be used in release coatings. Compositions, radiation-curing coating materials and release coatings can contain this organosiloxane. A method can be used to produce a release coating using this organosiloxane. The said organosiloxane is notable in that the at least one aromatic radical is bonded via a non-aromatic organic radical to a silicon atom.

Use of organosiloxanes comprising aromatic groups, in release coatings

Described is a method for synthesizing polymer compounds (P), preferably polysiloxanes, comprising at least one carboxylic ester group, in particular (meth)acrylate-containing polysiloxanes, said method being carried out in the presence of conversion products (U) of metal salts, in particular chromium(III) salts, and conversion products of aldehydes and primary amines.

Curable polymers

The invention provides for the use of hydroxyl-functional polyalkylorganosiloxanes of the general formula (IV) as solvents for cationic photoinitiators and for the use of these solutions in cationically curable silicones.

Use of hydroxyl-functional polyalkylorganosiloxanes as solvents for cationic photoinitiators for use in radiation- curable silicones

The present invention provides for the use of radiation-curable coating compositions comprising at least one radiation-curable organopolysiloxane having (meth)acrylic ester groups and a photoinitiator, wherein said photoinitiator includes at least one compound of the general formula in which

Use of hydroxyalkylphenone-type photoinitiators in radiation-curable organopolysiloxanes for producing abhesive coatings

Curable organopolysiloxanes are disclosed which contain oxyalkylene ether groups linked through SiOC groups; the oxyalkylene ether groups have the formula ##STR1## A method for the synthesis of these compounds, as well as their use as casting compositions, adhesive coating agents and modifying additives for compounds which can be cured cationically, by free radicals, or by high-energy radiation are also disclosed.

Curable organopolysiloxanes with oxyalkylene ether groups linked through

New, cationically curable oxyalkylene ethers and the synthesis thereof are disclosed. The oxyalkylene ethers, are of the general, average formula ##STR1## wherein R.sup.1 is an n-valent residual group derived from a compound (R.sup.1)H.sub.n from which n active hydrogen atoms have been split off and is capable of entering into an addition reaction with oxiranes, or a univalent alkyl or aryl group, and n.gtoreq.1;

Cationically curable oxalkylene ethers, method for their synthesis and

Curable polysiloxanes having oxyalkylene vinyl ether groups linked through SiC groups are disclosed wherein the vinyl groups may be substituted by alkyl. Methods for producing these compounds and their use as preferably photochemically curable polysiloxanes in various products are also disclosed.

Curable organopolysiloxanes having oxyalkylene ether groups ether groups

Novel polysiloxanes with (meth)acrylate groups and monocarboxylate groups and their use as radiation-curable abhesive coating matrials are disclosed. The modified polysiloxanes adhere well to the support that is to be coated and can be cured at a high rate on the support. The cured coating has good chemical and physical stabilities and a high flexibility. The abhesive properties can be adapted to the chemical character of the adhesives, so that the desired degree of abhesiveness is obtained.

Polysiloxanes with (meth)acrylate ester groups linked over SiC groups

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Essen, Germany

Hardi Döhler