Carl-zeiss-stiftung

Carl Zeiss Smt Gmbh

Carl Zeiss Ag

Harald Volkenandt

Gundula Weiss

Franz Krug

Werner Schreiber

Alexander Hinz

Thomas Alt

Uwe Frey

Bruno Neuhaus

Gundula Weiß

A microlithography projection exposure system has an illumination system with an illumination optical system. The latter can have at least one diffractive optical element, which is divided into multiple adjacently arranged individual elements, each of which has one specified bundle-forming and polarizing effect.

Method of producing a diffractive optical element and diffractive optical element produced by such a method

A head-mounted optical direct visualization system has at least one optical deflecting device () with an optical end element () for deflecting a virtual image generated by an image source () onto the optical end element (). The virtual image is emitted through the optical end element into the field of view in front of the eyes of the user. The optical deflecting device () is attached to the head of the user with the aid of a frame (). The task of the invention is to configure such a conventional direct visualization system so as to be better adaptable to the requirements of the anatomical and optical features of the user and the application-specific viewing requirements. This task is solved with an adjusting device (), which is fixed to the frame (), for variably changing the position of at least the optical end element () essentially in a plane parallel to the field of view of the user.

Head-mounted optical direct visualization system

Apparatus for the spatially resolved determination of the refractive power distribution of an optical element, with a light source unit for illuminating the optical element with an extended pencil of rays, includes a first multi hole screen for the production of a first number of beam pencils, a spatially resolving detector, and a computing unit. A controllable manipulator is arranged before or after the first multi hole screen. The first multi hole screen and the manipulator are transmissive only for a second number of beam pencils, the second number being smaller than the first number but greater than unity. The measurement principle of the apparatus corresponds to that of a Hartmann wavefront sensor.

Apparatus and process for spatially resolved refractive power determination

The invention is directed to a highly stable CO.sub.2 waveguide laser wherein a resonator block is used which is made of a material having a low thermal expansion coefficient. The resonator block includes a window which is transparent for the wavelength of the laser. Laser reflectors are provided which are mounted by wringing to the resonator body and define a vacuum-tight seal of the resonator body. In this way, the resonator block has a permanently defined adjustment.

CO.sub.2 waveguide laser

Growing community of inventors

Aalen, Germany

Harald Volkenandt