Carl Zeiss Microscopy Gmbh

Carl-Zeiss-Stiftung

Carl Zeiss Nts Gmbh

Harald Niebel

Gerd Ludwig Benner

Josef Biberger

Ralph Pulwey

Johannes Bihr

Rainer Arnold

Andreas Adolf

Dietrich Hoffmeister

Klaus Hegele

Ernst Draszba

Stephan Hiller

Richard König

A charged particle beam system for performing precession diffraction includes a lensfor focusing a beamin an object plane, and an objective lenshaving a diffraction plane. A doubletof lensesimages the diffraction planeinto an intermediate diffraction planewhere a multipoleis located. A doubletof lensesimages the intermediate diffraction planeinto an intermediate diffraction planewhere a multipoleis located. A first deflection systemupstream of the object planecan tilt to change an angle of incidence of the beam on the object plane. A second deflection systembetween lensesandtilts the beam such that the change of the angle of incidence of the charged particle beam on the object plane is compensated.

Precession diffraction charged particle beam system

A method for producing a representation of an object using a particle beam, as well as a particle beam device for carrying out the method are disclosed. The system described herein is based on the object of specifying the method and the particle beam device for producing a representation of an object such that images which are produced, in particular including FFT images, are as free as possible of artifacts which are not caused by the object to be examined. This is achieved in particular in that pixel lives, line flyback times and pixel pause times are varied in raster patterns.

Method for producing a representation of an object by means of a particle beam, as well as a particle beam device for carrying out the method

An electron beam device having a specimen holder, in particular for a transmission electron microscope (TEM), which makes it possible to identify the specimen holder in a simple manner is described. Therefore, the electron beam device has at least one specimen holder having at least one holding element for holding a specimen and at least one identification unit. Furthermore, the electron beam device has a reading unit for reading the identification unit without contact, a goniometer, into which the specimen holder may be inserted, and a controller for controlling the movement modes of the goniometer, via which the movement modes of the goniometer are controlled on the basis of the identification data supplied by the identification unit and of corresponding data stored in the controller.

Electron beam device having a specimen holder

The invention is directed to a high-voltage lead-through arrangement for introducing a high voltage into an enclosure wherein a vacuum is maintained such as for particle-beam apparatus. The arrangement includes: a high-voltage electrode for carrying a high potential; an insulator enclosing the high-voltage electrode and having a surface defining a boundary with the vacuum; and, an outer low-voltage electrode surrounding the insulator for carrying a low potential. The electrodes are spaced from each other by an electrode spacing measured along the surface of the insulator. The high-voltage electrode and the insulator conjointly define a first region wherein the high potential is present to a good approximation; and the first region is bounded by the insulator surface for a first distance of up to approximately 1/10 of the electrode spacing. The low-voltage electrode and the insulator conjointly define a second region wherein the low potential is present to a good approximation and the second region is bounded by the insulator surface for a second distance of up to approximately 1/10 of the electrode spacing. With this arrangement, the high-voltage lead-through can be operated at a higher voltage than the known configurations without the occurrence of micro-discharges.

High-voltage lead-through for particle-beam apparatus

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Oberkochen, Germany

Harald Niebel