Carl-zeiss-smt Ag

Carl Zeiss Smt Gmbh

Harald Kirchner

Willi Heintel

Yim-Bun Patrick Kwan

Bernhard Geuppert

Joachim Hartjes

Andreas Frommeyer

Hagen Federau

Wolfgang Keller

Jens Kugler

Bernhard Gellrich

Ulrich Weber

Stefan Xalter

Franz Sorg

Johannes Lippert

Timo Laufer

Dirk Schaffer

Ulrich Bingel

Tilman Schwertner

Andreas Ochse

Jean-Noel Fehr

Hans-Jürgen Scherle

Fraser G Morrison

G Fraser Morrison

There is provided an optical element unit comprising an optical element, a connector element, and an optical element holder. The optical element has a plane of main extension as well as an outer circumference and defines a radial direction. The connector element connects the optical element and the optical element holder, the connector element having a first connector part connected to the optical element at the outer circumference and a second connector part connected to the optical element holder. The first connector part and the second connector part are connected via at least one coupling part, the coupling part being compliant in the radial direction and substantially preventing rotation between the first connector part and the second connector part in a plane substantially parallel to the plane of main extension.

Optical element unit and method of supporting an optical element

There is provided an optical module for microlithography. The optical module includes an optical element and a retaining device for holding the optical element. The optical element has (a) a main extension plane, in which it defines a radial direction R and a circumferential direction U, and (b) a free optical diameter and an overrun in the region of its outer periphery. The retaining device contacts the optical element in the region of the overrun, and is formed and/or contacts the optical element in such a manner that the overrun ratio, calculated from the overrun related to a minimum overrun necessary for the production of the optical element, is at most 1.5.

Optical module with minimized overrun of the optical element

There is provided an optical element comprising an optical element body, a reflecting area and an optical passageway. The optical element body defines an axis of rotational symmetry. The reflecting area is disposed on the optical element body and adapted to be optically used in an exposure process. The optical passageway is arranged within the optical element body and allows light to pass the optical element body, the optical passageway being arranged eccentrically with respect to the axis of rotational symmetry.

Reflecting optical element with eccentric optical passageway

An optical subassembly with an optical element, for example a mirror element (), has an optical surface () and bearing points () arranged on the circumference. The optical element () is connected to a mount () at the bearing points () via connecting elements (). Stress-decoupling cutouts, for example curved slots (), are provided between the optical surface () and the bearing points ().

Optical subassembly and projection objective in semiconductor lithography

There is provided an optical component. The optical component includes a material having a surface that heats to a maximum temperature (T) when subjected to radiation. The material has a temperature-dependent coefficient of thermal expansion (&#x3b1;(T)) of about zero at a temperature Tthat is approximately equal to T. The optical component is suitable for use in any of an illumination system, a projection objective or a projection exposure system, as employed, for example, for EUV microlithography.

Optical component that includes a material having a thermal longitudinal expansion with a zero crossing

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Munich, Germany

Harald Kirchner