Semiconductor Manufacturing International (shanghai) Corporation

Semiconductor Manufacturing International (beijing) Corporation

Hao Zhong

Yi Hua Shen

Yihua Shen

Yunchu Yu

Yun Chu Yu

A semiconductor device includes a plurality of transistor components disposed on a semiconductor substrate, and a guard ring disposed on the semiconductor substrate surrounding the transistor components. The guard ring includes a plurality of fin structures disposed in parallel on the semiconductor substrate, a plurality of first conductive connection members disposed on the fin structures and connecting at least two fin structures, and a plurality of second conductive connection members connecting at least two first conductive connection members. The first conductive connection members and the second conductive connection members are formed as one structure.

Semiconductor device and electronic apparatus including the same

A method for manufacturing an integrated circuit may include the following steps: forming a first transistor, which includes a first active region; forming a second transistor, which includes a second active region; forming a third transistor, which includes a gate electrode that overlaps each of the first active region and the second active region; and providing a predetermined voltage to the gate electrode for turning off the third transistor to isolate the first transistor from the second transistor.

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Shanghai, China

Hao Zhong