Taiwan Semiconductor Manufacturing Comp. Ltd.

Hao-Ping Cheng

Hsin-Chang Lee

Ta-Cheng Lien

Ping-Hsun Lin

Hung-Yi Tsai

Pei-Cheng Hsu

Wei-Che Hsieh

Ming-Wei Chen

Szu-Ping Tsai

Methods for plasma stability in a plasma treatment tool are disclosed. A laser is positioned within a plasma treatment chamber within a skin depth of the electromagnetic field generated therein. The laser can be synchronized with the electrical triggering signals that generate the electromagnetic field. This scheme provides a stable and efficient method of plasma ignition.

Methods and systems for improving plasma ignition stability

A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorber layer disposed on the capping layer. The absorber layer includes a base material made of one or more of a Cr based material, an Ir based material, a Pt based material, or Co based material, and further contains one or more additional elements selected from the group consisting of Si, B, Ge, Al, As, Sb, Te, Se and Bi.

EUV photo masks and manufacturing method thereof

In a method of cleaning a photo mask, the photo mask is placed on a support such that a pattered surface faces down, and an adhesive sheet is applied to edges of a backside surface of the photo mask.

Cleaning method for photo masks and apparatus therefor

In a method of cleaning a photo mask, the photo mask is placed on a support such that a patterned surface faces down, and an adhesive sheet is applied to edges of a backside surface of the photo mask.

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Hsinchu, Taiwan

Hao-Ping Cheng