Chint Low Voltage Electrical Technology Co., Ltd.

Shanghai Ic R&d Center Co., Ltd

Hao Fu

Denggui Ao

Yongfu Xu

Lijun Yan

Pengfei Wang

Tao Zhou

Jiebin Duan

Lingyi Guo

Yan Yan

Dengyu Lu

Hongxia Sun

Xueru Yu

Xiucui Wang

Liren Li

Chen Li

Bowen Xu

An operating mechanism of a circuit breaker that includes a bracket, a rocker arm assembly, a jump buckle, a latch, a re-buckle, a first crank, a first spring and a first connecting rod, the jump buckle is in latching fit with the latch, and the re-buckle is in limiting fit with the latch; one end of the first crank is pivotally disposed on the jump buckle around a first axis, and the other end of the first crank is rotatably connected to one end of the first connecting rod around a second axis; the rocker arm assembly is driving fit with the first crank through the first spring; and slide rails disposed on the bracket and a slider slidably disposed on the slide rails, rotatably connected to the other end of the first connecting rod, and in driving fit with a moving contact mechanism of the circuit breaker.

Operating mechanism of circuit breaker

An operating mechanism of a circuit breaker, wherein two ends of a first spring are rotationally connected to a rocker arm assembly and a first crank through a first spring shaft and a second spring shaft respectively, and one end of a jump buckle is rotationally connected to a bracket and is a jump buckle pivoting end; a jump buckle hole of the jump buckle is aligned with a bracket hole of the bracket; the first spring shaft is in limiting fit with the jump buckle; and one end of the first crank swings in a direction away from the jump buckle pivoting end, such that a spacing between the first spring shaft and the second spring shaft is smaller than or equal to the length of the first spring, and a first assembly state is formed.

Operating mechanism of circuit breaker and assembling breaker

An operating mechanism of a circuit breaker, relating to the field of low-voltage electric appliances. The operating mechanism is provided with a double-slider mechanism, a first slider mechanism comprising a first crank, a first connecting rod, a sliding rail and a slider, and a second slider mechanism comprising a contact support, a second connecting rod, a sliding rail and a slider. The double-slider mechanism reduces the space requirement of the operating mechanism while increasing the opening distance of a moving contact, and the breaking performance is good. A circuit breaker comprising the operating mechanism, which provides good breaking performance.

Operating mechanism of circuit breaker, and circuit breaker

A quick tripping device with a moving contact mechanism that includes a contact support and a moving contact. An operating mechanism is in driving connection with the moving contact mechanism, so that the moving contact and a static contact are switched on or off. A first push rod is pivotally disposed on the contact support with one end in driving fit with the moving contact, a driving gap is formed between the one end and the moving contact, and a first push rod driving end of the first push rod is in driving fit with the operating mechanism to trip the operating mechanism. When the moving contact is repelled, the moving contact rotates relative to the contact support through the driving gap, and then contacts with the first push rod driven end and drives the first push rod to rotate, so that the operating mechanism is tripped.

Quick tripping device and circuit breaker

The present invention disclosures a critical dimension error analysis method, comprising: S: performing lithography processes on a wafer, measuring the critical dimension (CD) values of the test points in each of the fields respectively; M and N are integers greater than 1; S: removing extreme outliers from the critical dimension (CD) values; S: rebuilding remaining CD values by a reconstruction model fitting method, and obtaining rebuilt critical dimension (CD″) values, according to relative error between CD″ and CD, dividing the rebuilt critical dimension (CD″) values into scenes and the number of the scenes is A; S: calculating components and corresponding residuals of the test points in each of the scenes under a reference system corresponding to a correction model by parameter estimation; S: modifying machine parameters and masks by the correction model according to above calculation results. The present invention uses an outer limit to remove extreme outliers, so as to analyze a critical dimension error during a lithography process quickly and accurately.

Critical dimension error analysis method

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Shanghai, China

Hao Fu