Sony Interactive Entertainment Inc.

Lam Research Corporation

Hao Chi

Jin Zhang

James Beach

Mark Gadzikowski

Dustin Boyle

Jonathan Courney

Bart Jan Van Schravendijk

Thorsten B Lill

Meihua Shen

Hui-Jung Wu

Nagraj Shankar

Mark Naoshi Kawaguchi

Ananda K Banerji

Gowri Kamarthy

Kevin M McLaughlin

John Hoang

Jialing Yang

Nathan Musselwhite

Jay E Uglow

Gereng Gunawan

Aaron Lynn Routzahn

Nicholas Dominic Altieri

Methods for forming patterned multi-layer stacks including a metal-containing layer are provided herein. Methods involve using silicon-containing non-metal materials in a multi-layer stack including one sacrificial layer to be later removed and replaced with metal while maintaining etch contrast to pattern the multi-layer stack and selectively remove the sacrificial layer prior to depositing metal. Methods involve using silicon oxycarbide in lieu of silicon nitride, and a sacrificial non-metal material in lieu of a metal-containing layer, to fabricate the multi-layer stack, pattern the multi-layer stack, selectively remove the sacrificial non-metal material to leave spaces in the stack, and deposit metal-containing material into the spaces. Sacrificial non-metal materials include silicon nitride and doped polysilicon, such as boron-doped silicon.

Film stack simplification for high aspect ratio patterning and vertical scaling

A virtual reality (VR) system supports improved interactive control processes/services. These interactive control processes/services include detecting movement of a controller associated with a virtual reality (VR) environment, determining an angle of rotation based on the movement, determining a magnitude of force associated with the movement, determining a path in the VR environment that corresponds to the angle of rotation and the magnitude of force, and projecting the path in the VR environment.

Interactive input controls in a simulated three-dimensional (3D) environment

Growing community of inventors

San Mateo, CA, United States of America

Hao Chi