Korea Advanced Institute of Science and Technology

Other

Korea Institute of Science and Technology

Hansuek Lee

Sang Wook Han

Sangyoon Han

Ho Joong Jung

Yeseul Kim

Joonhyuk Hwang

Hyeon Hwang

Min Kyo Seo

Daegon Kim

Hyung Jun Heo

The present invention relates to a method for etching lithium niobate, the method including a process of etching lithium niobate using a mask pattern as a physical dry etching method using Ar plasma produced in a chamber through Ar gas, wherein in the process of etching lithium niobate, a process pressure of the chamber is maintained at 1 mTorr to 20 mTorr, and a method for forming a lithium niobate pattern using the same.

Method for etching lithium niobate and method for forming lithium niobate pattern using the same

Disclosed herein is a method of determining a concentration of a subject based on fraction bound measurement. The method of determining a concentration of a subject based on fraction bound measurement may include fixing a ligand to a surface of an optical device, measuring a fraction bound of a subject to be detected based on an optical signal when the subject reacts to the ligand fixed to the surface of the optical device, and determining a relative value of a concentration of the subject based on a ratio of measured values of the fraction bounds of the subject and a reference signal.

Method of determining concentration of subject based on fraction bound measurement

The present invention relates to an optical device comprising a first sub-chip and a second sub-chip flipped over on the first sub-chip. The first sub-chip includes a first substrate, a first lower cladding pattern on a first surface of the first substrate, and a first core layer on the first lower cladding pattern. The second sub-chip includes a second substrate, a second lower cladding pattern on a second surface of the second substrate, and a second core layer on the second lower cladding pattern. The first surface of the first substrate faces the second surface of the second substrate. The first lower cladding pattern has a first top surface parallel to the first surface and a first sidewall inclined to the first surface. The first core layer includes a first core part on the first top surface and a first side part on the first sidewall.

Optical device and method of fabricating the same

Growing community of inventors

Daejeon, South Korea

Hansuek Lee