Basf Aktiengesellschaft

Ineos Styrolution Group Gmbh

Basf Se Corporation

Milliken + Co

Udc Ireland Limited

Ciba Specialty Chemicals Corporation

Sony International (europe) Gmbh

Bayer Aktiengesellschaft

Sony Deutschland Gmbh

Robert Boschgmbh

E.i. Dupont De Nemours and Company

Colgate Palmolive Company

Dow Global Technolgoies LLC

Basfaktiengesellschaft

Ciba Specialty Chem. Corp.

Hans-Werner Schmidt

Mukundan Thelakkat

Markus Baete

Norbert Niessner

Christian Lennartz

Markus Bold

Christian Schildknecht

Paul Smith

Wolfgang Kowalsky

Hans-Hermann Johannes

Christian Neuber

Tristan Kolb

Tobias Schulz

Daniel Kremer

Nathan A Mehl

Walter A Scrivens

Keith Alan Keller

John D Anderson

Suchitra Datta

Martina Prinz

Akio Yasuda

Thomas Gessner

Karl-Heinz Etzbach

Gabriele Nelles

Sylke Haremza

Peter Schuhmacher

Frank Prechtl

Eike Jahnke

Robert Parker

Martina Egen

Markus Blomenhofer

Gerold Schmitt

Gisbert Michels

Norbert Schneider

Frank Meyer

Klaus Kahle

Simon Nord

Klaus H Stoll

Alexandre Terrenoire

Frank Eisentraeger

Janna Michaelis De Vasconcellos

Gabrielle Nelles

Florian Wieberger

Reiner Giesa

Christoph Schmitz

Thelakkat Mukundan

Haridas R Karickal

Donal Lupo

Stephanie Baumann

Josef Meiners

Peter Neumann

Rolf Wehrmann

Horst Berneth

Sai Ping Shum

Hui-Jung Wu

Peter Erk

Yigal Dov Blum

Wolfgang Paulus

Serguei Kostromine

Kurt Hoffmann

Walter Heitz

Robert Ray Burch

Rainer Hagen

Selim Bensason

Karin H Beck

Harm Wiese

Paul Joseph Vincenti

Hans-Rudolf Meier

Roelof Balk

Anthony J Esposito

Helmut Ringsdorf

Ingolf Hennig

Claus Gabriel

Morton L Barr

Thomas Bieringer

Matthew E Gande

Thomas W Cochran

Matthias Dust

Michael S Mendolia

Florian Richter

Meik Ranft

Rainer Xalter

Andrew J Leggio

Nils Mohmeyer

Martin Hueppauff

Hui Chin

Guenter Baur

Michiel Verswyvel

Arno Tuchbreiter

Oscar Lafuente Cerda

Hartmut Leininger

Anthony David Debellis

Dietmar Mäder

Bianca Wilhelmus

Hye Jin Park

Mohammed Abboud

Timothy Francis

Christoph Jonda

Kathrin K&uuml;rschner

Per Magnus Kristiansen

A trisamide compound has the structure of Formula (I) in which R, R, and Rare independently selected from the group consisting of alkyl groups. A polymer composition comprises a trisamide compound of Formula (I) and a polyolefin polymer. The polymer compositions containing a trisamide compound of Formula (I) exhibit very low haze levels and minimal extraction of the trisamide compound.

Trisamide compounds and compositions comprising the same

A composition comprises one or more trimesic acid derivatives of Formula (I) in which R, R, and Rare independently selected from the group consisting of alkyl groups. A polymer composition comprises a composition as described above and a polyolefin polymer. The polymer compositions containing a trimesic acid derivative of Formula (I) exhibit very low haze levels and minimal extraction of the trimesic acid derivative.

The invention relates to an improved process for providing purified styrenic monomers, such as styrene, from styrene-containing polymer waste. Styrene-containing waste is depolymerized in a suitable reactor, and the depolymerization products are condensed and separated in a three-step distillation process.

Process for de-polymerization of styrenic monomer-containing polymers and for retrieval of styrenic monomers

The present invention relates to the use of transition metal-carbene complexes in organic light-emitting diodes (OLEDs), to a light-emitting layer, to a blocking layer for electrons or excitons, or to a blocking layer for holes, each comprising these transition metal-carbene complexes, to OLEDs comprising these transition metal-carbene complexes, to devices which comprise an inventive OLED, and to transition metal-carbene complexes.

Use of transition metal carbene complexes in organic light-emitting diodes (OLEDs)

Thermoplastic polymer compositions (P) comprising at least one styrene-based polymer composition (A) comprising at least one graft copolymer (A-1), at least one organopolysiloxane compound, and optionally at least one colorant, dye or pigment, and/or at least one further additive, shows improved properties with respect to residual gloss after abrasion combined with improved melt flow characteristics while heat resistance is not affected.

Impact modified styrene copolymer composition comprising polysiloxane additive having improved abrasion characteristics

Use of transition metal complexes of the formula (I) in organic light-emitting diodes 

Transition metal complexes comprising carbene ligands serving as emitters for organic light-emitting diodes (OLED's)

A scratch-resistant thermoplastic polymer composition (P) comprising 88 to 99.9 wt.-% of at least one styrene-based copolymer, 0.1 to 5 wt.-% of at least one modified organopolysiloxane compound, and optionally at least one colorant, dye or pigment, and/or at least one further additive, provides with improved properties.

Scratch-resistant styrene copolymer composition containing modified organopolysiloxane compounds

A scratch-resistant thermoplastic polymer composition (P) comprising 40 to 99.9 wt.-% of at least one styrene-based copolymer, 0.1 to 20 wt.-% of at least one inorganic metal compound nanoparticle, and optionally at least one polymeric compatibilizing agent, at least one modified polysiloxane compound, at least one colorant, dye or pigment, and/or at least one further additive has improved scratch properties.

Scratch-resistant styrene copolymer composition containing inorganic metal compound nanoparticles

Thermoplastic polymer compositions (P) comprising 90 to 99.9 wt.-% of at least one styrene-based copolymer, 0.1 to 10 wt.-% of at least one copolymer at least comprising repeating units derived from at least one &#x3b1;-olefin monomer and at least one vinyl-aromatic monomer, at least one inorganic phosphate compound, at least one polyolefin wax and optionally at least one colorant, dye or pigment, and/or at least one further additive show improved properties with respect to residual gloss after abrasion combined with improved melt flow characteristics while heat resistance is not affected.

Styrene copolymer composition with improved residual gloss

Scratch-resistant thermoplastic polymer compositions (P) comprising 90 to 99.9 wt.-% of at least one styrene-based copolymer, 0.1 to 10 wt.-% of an aliphatic amide wax additive comprising at least one aliphatic amide wax composition having a melting point in the range of 80&#xb0; C. to 115&#xb0; C., and optionally at least one colorant, dye, pigment and/or further additive, have improved properties.

Scratch-resistant styrene copolymer composition containing amide wax

Thermally conductive polymer (TCP) resin compositions are described, comprising components (X) and (Y): 90 to 99.9% component (X) comprising components (I) and (II): 60 to 85% matrix polymer (I) comprising styrenic polymers (F) selected from: ABS resins, ASA resins, and elastomeric block copolymers of the structure (S&#x2014;(B/S))&#x2014;S; 15 to 40% thermally conductive filler material (II) (D1 to 200 &#x3bc;&#x3b7;&#x3b7;), consisting of a ceramic material and/or graphite; 0.1 to 10% chemical foaming agent (Y). Shaped articles made thereof can be used for automotive applications, as a heat sink for high performance electronics, LED sockets or electrical and electronic housings.

Thermally conductive polymer resin composition based on styrenics with low density

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Bayreuth, Germany

Hans-Werner Schmidt