Ciba Specialty Chemicals Corporation

Olin Microelectronic Chemicals, Inc.

Arch Specialty Chemicals, Inc.

Hans-Thomas Schacht

Norbert Muenzel

Carl-Lorenz Mertesdorf

Pasquale Alfred Falcigno

Gilbert Moegle

Heinz Holzwarth

Hans-Jorg Kirner

Ottmar Rohde, Deceased

Zhimin Hao

Barbara Wagner

Peter Scheibli

Seiji Homma

Ramaswami Sreenivasan

Christiane Griessen

Mudaliar Dayal Chandrasekhar

Reiner Jahn

Charles Edward Monnier

Process for pigmenting wood

The present invention relates to a colored, preferably natural porous material comprising in its pores an effectively coloring amount of an organic pigment which is obtained by fragmenting a meltable or solvent-soluble pigment precursor in the presence of a thermally activated acid precursor, and to a low to medium temperature process for its preparation.

Pigmented porous material

Method for producing thermally cleavable, soluble pigment derivatives

The present invention relates to a process for pigmenting a porous sintered material comprising boride, carbide, silicide, nitride or phosphide compounds by applying a solution of a soluble pigment derivative to the non-coloured sintered material and regenerating the organic pigment by heating, whereby the organic pigment is deposited into the sintered material's pores, as well as to the new pigmented sintered materials themselves.

Heat stable, pigmented sintered material comprising a boride, carbide, silicide, nitride or phosphide

Polymers having an average molecular weight M.sub.w (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), comprising structural repeating units of the formulae I-IV: ##STR1## in which R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 and w, x, y, and z are defined herein, are suitable as binders for DUV photoresists of high processing stability and flow resistance.

Polymers for photoresist compositions

Polymers having an average molecular weight M.sub.w (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), comprising structural repeating units of the formulae I-IV: ##STR1## in which R.sub.1, R.sub.2, R.sub.3 and R.sub.4 independently of one another are hydrogen, methyl or halogen, R.sub.5 and R.sub.6 independently of one another are C.sub.1 -C.sub.6 alkyl, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 independently of one another are hydrogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or halogen, and w, x, y and z are numbers equal to or greater than 1, with the provision that the quotient ##EQU1## which is obtainable from the sum of the structural units having protecting groups divided by the sum of all of the structural units present, obeys the condition 0.10.ltoreq.Q.ltoreq.0.50, are suitable as binders for DUV photoresists of high processing stability and flow resistance.

Photoresist compositions

A polymer which is insoluble in aqueous-alkaline developer solutions, and comprises structural units of the formula (I): ##STR1## in which R.sub.2 is hydrogen, C.sub.1 -C.sub.18 alkyl, C.sub.5 -C.sub.10 cycloalkyl, C.sub.5 -C.sub.14 aryl, C.sub.6 -C.sub.30 aralkyl, R.sub.3 is C.sub.1 -C.sub.18 alkyl, C.sub.5 -C.sub.10 cycloalkyl, C.sub.5 -C.sub.14 aryl, or C.sub.6 -C.sub.30 aralkyl, it being possible for the alkyl, cycloalkyl, aryl, or aralkyl groups to be substituted if desired by one or more hydroxyl groups or nitro groups or by one or more halogen atoms, and X is a k+1 valent organic radical, k being a number from 1 to 5, and 1 is a number from 0 to 4, in a quantity such that the cleavage products obtained by reaction with an acid are soluble in aqueous-alkaline developer solutions, is suitable as a binder for DUV photoresists of high processing stability, high contrast, and good resolution.

Organic solvent soluble photoresists which are developable in aqueous

Radiation-sensitive compositions comprising a substance which forms acid under the action of actinic radiation and polymers based on combination of different repeating units derived from hydroxy styrene and hydroxy-vinylcyclohexane derivatives wherein a portion of the hydroxyl groups are replaced with either acid-labile acetal or ketal protecting groups and where a portion of the repeating groups comprise two crosslinked species connected via the protecting groups.

Crosslinked polymers

Polymers based on combination of different repeating units derived from hydroxy styrene and hydroxyvinylcyclohexane derivatives wherein a portion of the hydroxyl groups are replaced with either acid-labile acetal or ketal protecting groups and where a portion of the repeating groups comprise two crosslinked species connected via the protecting groups.

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Rheinfelden, Germany

Hans-Thomas Schacht