Carl Zeiss Smt Gmbh

Hans-Michael Stiepan

Jochen Hetzler

Sebastian Fuchs

Karl-Heinz Schuster

Ulrich Wegmann

Susanne Beder

Peter Klopfleisch

Ulrich Mantz

Andrea Berner

Andy Zott

André Dirauf

An optical system includes at least one optical element which has an optically effective surface and which is designed for an operating wavelength of less than 30 nm. The optical system also includes a heating arrangement for heating this optical element and comprising a plurality of IR emitters for irradiating the optically effective surface with IR radiation. The IR emitters are activatable and deactivatable independently of each other to variably set different heating profiles in the optical element. The optical system further includes at least one beam shaping unit for shaping the beam of the IR radiation steered onto the optically effective surface by the IR emitters. The optical system also includes a multi-fiber head comprising a multi-fiber connector for connecting optical fibers. IR radiation from a respective one of the IR emitters is suppliable by way of each of these optical fibers.

Optical system, heating arrangement, and method for heating an optical element in an optical system

In an aspect, a plurality of parameters characteristic of the patterned wafer are determined based on measurements of the intensity of electromagnetic radiation after the diffraction thereof at the patterned wafer. The intensity measurements are carried out for at least one used structure and at least one auxiliary structure. The parameters are determined based on intensity values measured during the intensity measurements for respectively different combinations of wavelength, polarization and/or order of diffraction, and also on the basis of correspondingly calculated intensity values, with a mathematical optimization method being applied.

Method and device for characterizing a wafer patterned using at least one lithography step

A measurement arrangement and a method for measuring a wavefront aberration of an imaging optical system () of a microlithographic projection exposure apparatus. The method includes separate measurement of respective wavefront aberrations of different partial arrangements (M; M; M; M, M) of the optical elements.

Measuring method and measuring arrangement for an imaging optical system

A test appliance and a method for testing a mirror, e.g., a mirror of a microlithographic projection exposure apparatus. The test appliance has a computer-generated hologram (CGH), and a test can be carried out on at least a portion of the mirror by way of an interferometric superposition of a test wave that is directed onto the mirror by this computer-generated hologram and a reference wave. Here, the computer-generated hologram (CGH) () is designed in such a way that, during operation of the appliance, it provides a first test wave for testing a first portion of the mirror () by interferometric superposition with a reference wave in a first position of the mirror () and at least a second test wave for testing a second portion of the mirror () by interferometric superposition with a reference wave in a second position of the mirror ().

Test device and method for testing a mirror

A measurement arrangement () and an associated method for interferometrically determining the surface shape () of a test object () includes a light source () providing an input wave () and a diffractive optical element (). The diffractive optical element is configured to produce in each case by way of diffraction from the input wave a test wave (), which is directed at the test object () and has a wavefront that is adapted at least partially to a desired shape of the optical surface, and a reference wave (). The measurement arrangement furthermore includes a reflective optical element () that back-reflects the reference wave () and a capture device () that captures an interferogram produced by superposing the test wave after interaction with the test object and the back-reflected reference wave (), in each case after a further diffraction at the diffractive optical element in a capture plane ().

Growing community of inventors

Aalen, Germany

Hans-Michael Stiepan