Eastman-kodak Company

Hans M Wagner

Wojciech M Przezdziecki

Malcolm D Purbrick

Colin Holstead

Karel L Petrak

John H Boielle

Joanna Bowen

John F Langford

Roderick J Bowers

Gerald B Sharp

Polymerizable composition

There is disclosed a radiation-sensitive composition and element comprising (a) a water-soluble polymer containing a quaternized nitrogen in a 5-membered ring and (b) a photoinitiator, and processes for preparing the polymer and for using the composition.

Photo-polymerizable water-developable composition and elements

Light-sensitive compositions including a polymer of the type that is reactable with an azide sensitizer when exposed to light and a sensitizing amount of a naphthalene sensitizer having ortho diazo and oxo substituents at the 1,2 or the 2,1 positions of the naphthalene nucleus and further having an azidosulfonyl substituent group of which the sulfonyl moiety is bonded directly to the naphthalene nucleus at the 4 or the 5-position, are advantageous in the preparation of positive-working photolithographic materials. IN the azidosulfonyl group, the azido moiety can be linked directly or indirectly to the sulfonyl moiety, such as in the compounds 2-diazo-1,2-dihydro-1-oxo-5(4'-azidophenoxysulfonyl)naphthalene and 5-azidosulfonyl-2-diazo-1,2-dihydro-1-oxonaphthalene. The light-sensitive compositions can be coated on support materials to prepare composite photographic elements having utility as photolithographic printing masters and photoresists for etching operations.

Light-sensitive diazoketone and azide compositions and photographic

Growing community of inventors

Stanmore, United Kingdom

Hans M Wagner