Leybold Aktiengesellschaft

Emerson Process Management Gmbh & Co. Ohg

Hans Krause

Albert Randow

Rudi Ross

Helmut Stoll

Ulrich Modlinski

Helmut Dandl

Rudi Roess

Helmut Koch

In a method and apparatus for measuring the optical absorption of samples having a light source (), a photoelectric converter (), a measurement beam path extending between the light source () and the converter (), in which path the sample to be examined is arranged, a reference beam path extending between the light source () and the converter (), in which path a reference sample is arranged, and a motor-driven chopper disc (), the chopper disc () is configured with a first number of first openings () unblocking only the measurement beam path and a second number of second openings () unblocking only the path for the reference beam. A lock-in amplifier () and a device () for synchronising the lock-in amplifier () with the chopper disc () is connected to the converter () and an evaluation circuit () establishes the quotient of the transmitted intensity of the reference beam path detected by the converter () and the transmitted intensity of the measurement beam path detected by the converter () as a measurement for the concentration of the sample in such a way that the decrease in the intensity of the beam by absorption leads to an increase in sensitivity.

Method and apparatus for measuring the optical absorption of samples

A microrheoscopic detector for gases including two thin wire resistance thermometers and a heating conductor disposed between the two resistance thermometers, the resistance thermometers being positioned in the area of influence of the heating conductor and spaced therefrom in a definite spatial fixation, the heating conductor having a span transverse gas flow path and comprising a plurality of parallel conductor legs laying in the span in the same plane as the resistance thermometers.

Microrheoscopic detector for gas flows

A method for manufacturing a film resistor for use as a thermal conductivity detector, particularly for gas analyzers. The film resistor is composed of a carrier of insulating material and of a thin resistance layer, preferably composed of platinum, that is applied to the carrier by cathode sputtering in an atmosphere inert gas. The resistant layer and the carrier are cleaned proceeding from the metallized side using an argon sputtering process. The film resistor is then coated with at least one plasma-enhanced CVD layer for the purpose of protection against aggressive gases.

Method for manufacturing a film resistor

A paramagnetic gas measuring device/instrument including an infrared radiator for irradiating diamagnetic members of the device and for creating a climate within a measuring chamber suitable to evaporate moisture from the members and a gas being analyzed.

Method and apparatus for measuring a gas by exploiting the paramagnetic

In a friction bearing system for a rapidly rotating shaft of an apparatus for measuring the optical absorption of a sample under analysis by way of an optical radiation source projecting a beam on the sample, the chopper system for the periodical interruption of the beam includes a rotatably mounted chopper disk provided with light-admitting openings and a controlled-speed drive system, as well as a radiation detector for the light affected by the sample. Both ends of the shaft fixedly joined to the chopper disk are provided with pivots corresponding to bushes, one of which is held by a spider which is affixed to the housing part that holds the other bush. The spider is provided with a bore running at an angle to the shaft, and the longitudinal axis of this bore intersects the axis of rotation of the shaft. A magnet is held for longitudinal displacement in the bore and its field acts upon a ring disposed on the shaft in order to assure the quiet and wear-free spinning of the chopper disk.

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Bad Nauheim, Germany

Hans Krause