Bayer Aktiengesellschaft

Agfa-gevaert Ag

Hans-Jurgen Rosenkranz

Hans Rudolph

Erich Wolff

Harald Von Rintelen

Heinrich Wolfers

An improvement in a process for the preparation of a pinacol of the formula ##STR1## wherein R.sup.1 and R.sup.2 are identical or different and represent optionally substituted aliphatic, cycloaliphatic, araliphatic or an aromatic hydrocarbon radical by reducing a ketone of the formula ##STR2## wherein R.sup.1 and R.sup.2 have the abovementioned meanings with a base metal, the improvement comprising carrying out the reduction in the presence of an organic halogen compound and in the presence of a phosphoric acid amide, phosphoric acid ester and/or carboxylic acid amide.

Process for the preparation of pinacols

Relief or resist images can be produced by means of a photosensitive material including a photosensitive layer with a polymer as defined hereinafter containing vinyl groups capable of being cross-linked upon exposure to actinic light to yield unsoluble cross-linked products at the exposed areas while the polymer in the unexposed areas remain soluble.

Polymers which can be cross-linked by photopolymerization

Photosensitive polymers and their process of preparation which can be crosslinked by a vinyl polymerization initiated by photochemical means and which are derived from the reaction of polymers containing zerewitinoff-active hydrogen atoms with N-methylol compounds or with N-Methylol ethers of acrylamides or substituted acrylamides. The modified polymers optionally in admixture with other vinyl group containing monomers are useful for purposes such as photosensitive copying layers, coatings and molded articles.

Growing community of inventors

Krefeld, Germany

Hans-Jurgen Rosenkranz