Olin Microelectronic Chemicals, Inc.

Ocg Microelectronic Materials, Inc.

Hans-Jorg Kirner

Carl-Lorenz Mertesdorf

Hans-Thomas Schacht

Norbert Muenzel

Pasquale Alfred Falcigno

Heinz Holzwarth

Ottmar Rohde, Deceased

Bertold Nathal

Radiation-sensitive compositions comprising a substance which forms acid under the action of actinic radiation and polymers based on combination of different repeating units derived from hydroxy styrene and hydroxy-vinylcyclohexane derivatives wherein a portion of the hydroxyl groups are replaced with either acid-labile acetal or ketal protecting groups and where a portion of the repeating groups comprise two crosslinked species connected via the protecting groups.

Crosslinked polymers

Polymers based on combination of different repeating units derived from hydroxy styrene and hydroxyvinylcyclohexane derivatives wherein a portion of the hydroxyl groups are replaced with either acid-labile acetal or ketal protecting groups and where a portion of the repeating groups comprise two crosslinked species connected via the protecting groups.

A process for the preparation of phenolic resins having acid-labile acetal or ketal protecting groups by reacting a phenolic resin with an enol ether in the presence of an acidic catalyst and subsequently treating the reaction mixture with a basic anion exchanger gives heat-resistant polymers which, in combination with acid photogenerators, produce radiation-sensitive compositions of high processing stability with a greatly improved shelf life.

Process for the preparation of partially protected phenolic resins

Growing community of inventors

Pratteln, Switzerland

Hans-Jorg Kirner