Carl-zeiss-smt Ag

Carl Zeiss Smt Gmbh

Hans-Jochen Paul

Christoph Zaczek

Thomas Schicketanz

Matthias Heller

Aurelian Dodoc

Sascha Migura

Joern Weber

Ralf Kuschnereit

Gerhard Braun

Harry Bauer

Jens Ullmann

Patrick Scheible

Toralf Gruner

Hans-Juergen Mann

Heiko Feldmann

Michael Totzeck

Norbert Wabra

Boris Bittner

Michael Gerhard

Hartmut Enkisch

Ralf Mueller

Eric Eva

Stephan Muellender

Wilfried Clauss

Oliver Dier

Gisela Von Blanckenhagen

Ralf Winter

Bernhard Weigl

Sebastian Strobel

Roland Loercher

Christian Grasse

An optical arrangement includes an optical element () and a thermal manipulation device. The optical element has a substrate (), a coating () applied to the substrate (), and an antireflection coating (). The coating () includes: a reflective multi-layer coating () configured to reflect radiation () with a used wavelength (&#x3bb;). The antireflection coating () is arranged between the substrate () and the reflective multi-layer coating () to suppress reflection of heating radiation () with a heating wavelength (&#x3bb;) that differs from the used wavelength (&#x3bb;). The thermal manipulation device has at least one heating light source () to produce heating radiation ().

Optical element and optical arrangement therewith

An EUV mirror with a substrate and a multilayer arrangement including: a periodic first layer group having N&#x3e;1 first layer pairs of period thickness Pand arranged on a radiation entrance side of the multilayer arrangement; a periodic second layer group having N&#x3e;1 second layer pairs of period thickness Pand arranged between the first layer group and the substrate; and a third layer group having Nthird layer pairs arranged between the first and second layer groups. N&#x3e;N. The third layer group has a third period thickness Pwhich deviates from an average period thickness P=(P+P)/2 by a period thickness difference &#x394;P. &#x394;P corresponds to the quotient of the optical layer thickness (&#x3bb;/4) of a quarter-wave layer and the product of Nand cos(AOI), AOIbeing the mean incidence angle for which the multilayer arrangement is designed.

EUV mirror and optical system comprising EUV mirror

A reflective optical element () having a substrate () and a multilayer system () that has a plurality of partial stacks (), each with a first layer () of a first material and a second layer () of a second material. The first material and the second material differ from one another in refractive index at an operating wavelength of the optical element. Each of the partial stacks has a thickness (D) and a layer thickness ratio (&#x393;), wherein the layer thickness ratio is the quotient of the thickness of the respective first layer and the partial stack thickness (D). In a first section of the multilayer system, for at least one of the two variables of partial stack thickness (D) and layer thickness ratio (&#x393;), the mean square deviation from the respective mean values therefor is at least 10% less than in a second section of the multilayer system.

Reflective optical element, and optical system of a microlithographic projection exposure apparatus

A mirror (') for the EUV wavelength range and having a substrate (S) and a layer arrangement, wherein the layer arrangement includes at least one surface layer system (P&#x2032;&#x2033;) consisting of a periodic sequence of at least two periods (P) of individual layers, wherein the periods (P) include two individual layers composed of different materials for a high refractive index layer (H&#x2032;&#x2033;) and a low refractive index layer (L&#x2032;&#x2033;), wherein the layer arrangement includes at least one surface protecting layer (SPL, L) or at least one surface protecting layer system (SPLS) having a thickness of greater than 20 nm, and preferably greater than 50 nm.

Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective

An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength &#x3bb;has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.

Reflective optical imaging system

An optical system of a microlithographic projection exposure apparatus permits comparatively flexible and fast influencing of the intensity distribution and/or the polarization state. The optical system includes at least one layer system that is at least one-side bounded by a lens or a mirror. The layer system is an interference layer system of several layers and has at least one liquid or gaseous layer portion with a maximum thickness of one micrometer (&#x3bc;m), and a manipulator for manipulation of the thickness profile of the layer portion.

Interference systems for microlithgraphic projection exposure systems

An attenuating filter provides a prescribed attenuation of the intensity of transmitted, short-wavelength, ultraviolet light, in particular, at wavelengths below 200 nm, that is governed by a predefinable spatial distribution of its spectral transmittance. The filter has a transparent substrate (), e.g. fabricated from crystalline calcium fluoride. A filter coating () fabricated from a dielectric material that absorbs over a predefined wavelength range is applied to at least one surface () of the substrate. In the case of operating wavelengths of about 193 nm, the filter coating consists largely of tantalum pentoxide. Filters of the type, which may be inexpensively fabricated with high yields, are noted for their high abilities to withstand laser radiation and may be effectively antireflection coated employing simply designed antireflection coatings.

Attenuating filter for ultraviolet light

An optical component and a coating system for coating substrates for optical components with essentially rotationally symmetric coatings, the system having a planetary-drive system () that has a rotating planet carrier () and several planets (), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks () that allow controlling the radial variation in physical film thickness is arranged between a source () of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (&#x3b2; max) for every substrate also corotate with the primary carrier (), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.

Optical component and coating system for coating substrates for optical components

Antireflection multilayer coatings with only three or four layers are proposed for the production of laser resistant optical components with minimal residual reflection and high transparency for UV light in a wavelength range approx. 150 nm to approx. 250 nm at large angles of incidence in the range of approx. 70&#xb0; to approx. 80&#xb0;, particularly in the range between approx. 72&#xb0; and approx. 76&#xb0;. For incident p-polarized UV light three-layer systems can be used, in which a layer of low refractive material, in particular magnesium fluoride is arranged between two layers of high refractive material and, in the case of the specified wavelength, of minimally absorbent material, in particular of hafnium oxide or aluminum oxide. For example, this allows a residual reflection of perceptibly less than 1% to be achieved in the case of a wavelength of 248 nm at angles of incidence in the range between approx. 72&#xb0; and approx. 76&#xb0;.

Antireflection coating for ultraviolet light at large angles of incidence

A method for coating substrates () for optical components with essentially rotationally symmetric coatings employs a coating system equipped with a planetary-drive system () that has a rotating planet carrier () and several planets (), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks () that allow controlling the radial variation in physical film thickness is arranged between a source () of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (&#x3b2; max) for every substrate also corotate with the primary carrier (), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.

Method and coating system for coating substrates for optical components

A catadioptric objective is provided with a beam splitter surrounded at least partially by a mount, with a mirror, with a plurality of lenses and with a &lgr;/4 plate arranged between the mirror and the beam splitter. Arranged between the beam splitter and the mount on the side on which false light emerges from the beam splitter is an absorption device that absorbs false light traversing the beam splitter

Catadioptric objective

An optical component with a low reflectance for ultraviolet light in a wavelength range between approx. 180 nm and approx. 370 nm, in particular approx. 248 nm, and for a high angle of incidence up to at least approx. 40&deg; has a substrate and a multilayer antireflection system arranged on at least one surface of said substrate to provide reflection reduction. The multilayer system distinguishes itself in that the layer adjacent to the substrate does not consist of magnesium fluoride and that none of the layers has a thickness of more than half of the working wavelength. In particular, the layer thicknesses of the low refractive materials should not exceed &frac13; the working wavelength. By adhering to these boundary conditions, antireflective coatings can be produced that provide both permanent laser resistance as well as a high resistance against inner layer stress and thermal stress.

Antireflection coating for ultraviolet light

Antireflection multilayer coatings with only three or four layers are proposed for the production of laser resistant optical components with minimal residual reflection and high transparency for UV light in a wavelength range approx. 150 nm to approx. 250 nm at large angles of incidence in the range of approx. 70&deg; to approx. 80&deg;, particularly in the range between approx. 72&deg; and approx. 76&deg;. For incident p-polarized UV light three-layer systems can be used, in which a layer of low refractive material, in particular magnesium fluoride is arranged between two layers of high refractive material and, in the case of the specified wavelength, of minimally absorbent material, in particular of hafnium oxide or aluminum oxide. For example, this allows a residual reflection of perceptibly less than 1% to be achieved in the case of a wavelength of 248 nm at angles of incidence in the range between approx. 72&deg; and approx. 76&deg;.

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Aalen, Germany

Hans-Jochen Paul