Solarworld Aktiengesellschaft

Bayer Aktiengesellschaft

Bayer Intellectual Property Gmbh

Hans-Joachim Leimkühler

Hans-Dieter Block

Johannes-Peter Schäfer

Dirk Müller

Georg Ronge

Stephan Klein

Werner Dick

Rainer Weber

Leslaw Mleczko

Herbert Stutz

Gebhard Wagner

Knud Werner

Wolfgang Leuckel

Ulrike Strauss

Dietmar Schwanke

Helmut Schmidt

The invention relates to a method of producing silane or hydrochlorosilanes by disproportionation of a higher chlorinated hydrochlorosilane or a mixture of said hydrochlorosilanes in the presence of a catalyst. Before the catalyst is used, it is a) washed with hyper-pure water in one or several steps; b) transferred in the water-moist state to the reactor in which the disproportionation is to proceed; c) treated in the reactor with boiling methanol or rinsed with anhydrous methanol; and d) the methanol is removed from the catalyst by evacuation and/or stripping with inert gas. The invention further relates to a method for treating disproportionation catalysts.

Method for producing silanes

Silane is produced in a continuous process by disproportionating trichlorsilane in at least 2 recreation areas for reaction/distillation, which are run through by a countercurrent of steam and liquid in the presence of catalytically active solid under a pressure which ranges between 500 mbar and 50 bar.

Method and facility for producing silane

This invention relates to a continuous process for the preparation of silane by catalytic disproportionation of trichlorosilane in a reactive/distillative reaction zone having a catalyst bed of catalytically active solid.

Method and system for producing silane

The invention relates to a method for the production of high purity silicon, characterized by the following steps: a) reaction of metallic silicon with silicon tetrachloride (SiCl), hydrogen (H) and hydrochloric acid (HCl) at a temperature of 500 to 800&#xb0; C. and a pressure of 25 to 40 bar to give a trichlorosilane-containing (SiHCl) feed gas stream, b) removal of impurities from the resultant trichlorosilane-containing feed gas stream by scrubbing with condensed chlorosilanes at a pressure of 25 to 40 bar and a temperature of 160 to 200&#xb0; C. in a multi-stage distillation column, to give a purified trichlorosilane-containing feed gas stream and a solid-containing chlorosilane suspension and a distillative separation of the purified feed gas stream into a partial stream essentially comprising SiCland a partial stream, essentially comprising SiHCl, c) disproportionation of the SiHCl-containing partial stream to give SiCland SiH, whereby the disproportionation is carried out in several reactive/distillative reaction zones, with a counter-current of vapour and liquid, on catalytic solids at a pressure of 500 mbar to 50 bar and SiHClis introduced into a first reaction zone, the lower boiling SiH-containing disproportionation product produced there undergoes an intermediate condensation in a temperature range of &#x2212;25&#xb0; C. to 50&#xb0; C., the non-condensing SiH-containing product mixture is fed to one or more further reactive/distillative reaction zones and the lower boiling product thus generated, containing a high proportion of SiHis completely or partially condensed in the head condenser and d) thermal decomposition of the SiHto give high purity silicon.

Method for production of high purity silicon

The invention relates to a method for removing anhydrous acids and hydrohalogens from trichlorosilane by contacting the trichlorosilane with solid bases. The invention further relates to the use of the trichlorosilane so purified in the production of silane and/or super-pure silicon.

Method for purifying trichlorosilane

The present invention relates to a process for preparing (cyclo)aliphatic diisocyanates and triisocyanates corresponding to the formulaR&#x2014;(NCO)&#x2003;&#x2003;(I),wherein

Process for preparing (cyclo)aliphatic isocyanates

Growing community of inventors

Leverkusen, Germany

Hans-Joachim Leimkühler