Asml Netherlands B.v.

Hans Jansen

Sjoerd Nicolaas Lambertus Donders

Bob Streefkerk

Christiaan Alexander Hoogendam

Jeroen Johannes Sophia Maria Mertens

Marco Koert Stavenga

Johannes Catharinus Hubertus Mulkens

Johannes Jacobus Matheus Baselmans

Jacobus Johannus Leonardus Hendricus Verspay

Erik Roelof Loopstra

Martinus Hendrikus Antonius Leenders

Roelof Frederik De Graaf

Timotheus Franciscus Sengers

Jan-Gerard Cornelis Van Der Toorn

Michel Riepen

Johannes Henricus Wilhelmus Jacobs

Bauke Jansen

Marcel Mathijs Theodore Marie Dierichs

Martinus Cornelis Maria Verhagen

Richard Joseph Bruls

Helmar Van Santen

Aleksey Yurievich Kolesnychenko

Anthonius Martinus Cornelis Petrus De Jong

Joeri Lof

Alexander Straaijer

Antonius Theodorus Anna Maria Derksen

Franciscus Johannes Joseph Janssen

Franciscus Johannes Herman Maria Teunissen

Felix Godfried Peter Peeters

Arjen Boogaard

Anthonie Kuijper

Peter Franciscus Wanten

Patricius Aloysius Jacobus Tinnemans

Sergei Shulepov

Herman Boom

Gheorghe Tanasa

Jan Cornelis Van Der Hoeven

Ronald Walther Jeanne Severijns

Cedric Desire Grouwstra

Robert Douglas Watso

Hernes Jacobs

Paulus Martinus Maria Liebregts

Antonius Johannus Van Der Net

Ivo Adam Johannes Thomas

Marcio Alexandre Cano Miranda

Kornelis Tijmen Hoekerd

Jeroen Peter Johannes Bruijstens

Maurice Martinus Johannes Van Der Lee

Lejla Seuntiens-Gruda

Johannes Wilhelmus Jacobus Leonardus Cuijpers

Teunis Cornelis Van Den Dool

Siebe Landheer

Peter Smits

Jacques Cor Johan Van Der Donck

Sebastiaan Maria Johannes Cornelissen

Arnout Johannes Meester

Jan Willem Cromwijk

Raymond Gerardus Marius Beeren

Hubertus Leonardus Franciscus Heusschen

Nicolaas Ten Kate

Youri Johannes Laurentius Maria Van Dommelen

Laurentius Catrinus Jorritsma

Peter Paul Steijaert

Nadja Schuh

Lambertus Dominicus Noordam

Hans Butler

Klaus Simon

Joannes Theodoor De Smit

Hendricus Johannes Maria Meijer

Roelof Aeilko Siebrand Ritsema

Erik Theodorus Maria Bijlaart

Dzmitry Labetski

Frank Van Schaik

Hendrikus Gijsbertus Schimmel

Johannes Christiaan Leonardus Franken

Jimmy Matheus Wilhelmus Van De Winkel

Ramin Badie

Henricus Jozef Castelijns

Pieter Jacob Kramer

Reinier Theodorus Martinus Jilisen

Wilbert Jan Mestrom

Arjan Hubrecht Josef Anna Martens

Albert Pieter Rijpma

Dennis Jozef Maria Paulussen

Jacob Brinkert

Peter Van Putten

Wim Ronald Kampinga

Gerrit Van Der Straaten

Nicolaas Rudolf Kemper

Noud Jan Gilissen

Marcus Martinus Petrus Adrianus Vermeulen

Gerardus Adrianus Antonius Maria Kusters

Gerrit Oosterhuis

Sandra Van Der Graaf

Josephus Cornelius Johannes Antonius Vugts

Tjarko A R Van Empel

Koen Kivits

Vasco Miguel Matias Serrao

Leon Joseph Marie Van Den Schoor

Eric Willem Felix Casimiri

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Lithographic apparatus and device manufacturing method

An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

Immersion liquid, exposure apparatus, and exposure process

A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.

Lithographic apparatus and device manufacturing method involving a liquid confinement structure

A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Lithographic apparatus and a method of operating the apparatus

A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Radiation source and lithographic apparatus

An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.

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Eindhoven, Netherlands

Hans Jansen