Siemens Aktiengesellschaft

Hans Hauschildt

Siegfried Birkle

Roland Rubner

Wolfgang Von Gentzkow

Helmut Markert

Manfred Schmiedel

Eva-Maria Rissel

A method for radical cross-linking or organic polymers, is disclosed which uses a cross-linking enhancer of the following formula ##STR1## wherein R is alkenyl or alkynyl;

Method for radical cross-linking of organic polymers

The invention relates to a method for the manufacture of positive resist structures by means of short-wave UV rays and has the objective to develop such a method in a manner such that increased sensitivity and resolution as well as high thermal stability and, in addition, transparency in the wave-length range above 260 nm can be achieved. According to the invention, it is provided for this purpose to use as the resist material copolymers of 1 to 70 mol % alkylmethacrylate with an alkyl radical having 1 to 4 C atoms, and 99 to 30 mol % of an ethylenically unsaturated monomer with chlorine and/or cyan substituents. The method according to the invention is particularly well suited for producing resist structures about 0.5 to 2 .mu.m thick by means of UV rays in the wave-length range between about 180 to 260 nm.

Method for the manufacture of resist structures

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Erlangen, Germany

Hans Hauschildt