Aixtron Se

Cemecon-Ceramic Metal Coatings-Dr. Ing. Antonius Leyendecker Gmbh

Cemecon-Ceramic Metal Coatings

Hans-Gerd Fuss

Georg Erkens

Stefan Esser

Antonius Leyendecker

Rainer Wenke

Bernd Hermeler

Ingo Künzel

A device, for depositing a layer on a substrate by supplying one or more process gases to a process chamber, includes a susceptor and one or more transmitter coils. The susceptor bearing the substrate can be heated to a process temperature by means of an electromagnetic alternating field generated by the one or more transmitter coils. The one or more transmitter coils have a coating that consists of tin and nickel in order to provide a corrosion-resistant coating, which simultaneously has low emissivity and is therefore effective in the presence of chlorine compounds and moisture.

Coating device having coated transmitter coil

The invention relates to a process for producing a hard-material-coated component, comprising the following steps: application of a layer of hard material to the component in a PVD coating unit; and structural further processing of the outer surface of the layer of hard material, and to a component produced using the process. Particularly in the case of thick coatings or coatings with a columnar structure, such processes have a problem producing a sufficiently smooth surface on the coating. The problem is solved by the fact that for the structural further processing, the surface of the layer is blasted in a blasting device in order to improve this surface, an inorganic blasting agent with a grain size in the range from 1 &#x3bc;m to 100 &#x3bc;m and a sharp-edged grain shape being used.

Process for producing a hard-material-coated component

The invention relates to a PVD coating method and to a PVD coating device with a chamber in which at least one target cathode, at least one anode and at least one substrate holder which is intended to hold at least one substrate are arranged, and with a control device which delivers a first voltage in order to supply the target cathode with a negative electrical potential relative to the anode in order to form a plasma in which the substrate is arranged, and which delivers a second voltage in order to supply the anode with a positive electrical potential relative to the chamber wall. In this sputter-coating device, the ion fraction of the target material which can be achieved is too low for qualitatively satisfactory coating properties. It is increased according to the invention in that the control device delivers a third voltage which supplies the substrate with an electrical potential that is more negative than the potential of the anode.

Method and device for PVD coating

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Herzogenrath, Germany

Hans-Gerd Fuss