Applied Materials, Inc.

Applied Materials Gmbh & Co Kg

Applied Films Gmbh & Co. Kg

Hans-Georg Lotz

Neil Morrison

Thomas Deppisch

Michael Wayne Stowell, Jr

Stefan Hein

Wolfgang Buschbeck

Gerd Hoffmann

Tobias Stolley

Volker Hacker

Rainer Ludwig

Peter Skuk

Florian Ries

Heike Landgraf

Gerhard Steiniger

Guenter Klemm

Peter Sauer

Günter Klemm

Jürgen Schroeder

Alexander Wolff

Manuel Jose Dieguez-Campo

A process for manufacturing a transparent body for a touch screen panel is described. The process includes: depositing a first transparent layer stack over a flexible transparent substrate, wherein said first transparent layer stack includes at least a first dielectric film with a first refractive index, and a second dielectric film with a second refractive index different from the first refractive index; providing a transparent conductive film over the first transparent layer stack; depositing a layer of a conductive material over the transparent conductive film; providing a polymer layer over the layer of a conductive material; imprinting a pattern, e.g. a 3D pattern, on the polymer layer; etching the layer of the conductive material based upon the pattern to form conductive paths for the touch screen panel; and etching the transparent conductive film based upon the pattern to form a structured transparent conductive pattern for touch detection.

Transparent body for a touch panel manufacturing method and system for manufacturing a transparent body for a touch screen panel

A process for manufacturing a transparent body for use in a touch panel is provided. The process includes: The process includes depositing a first transparent layer stack over a substrate with a first silicon-containing dielectric film, a second silicon-containing dielectric film, and a third silicon-containing dielectric film. The first and the third silicon-containing dielectric films have a low refractive index and the second silicon-containing dielectric film has a high refractive index. The process further includes depositing a transparent conductive film in a manner such that the first transparent layer stack and the transparent conductive film are disposed over the substrate in this order. At least one of the first silicon-containing dielectric film, the second silicon-containing dielectric film, the silicon-containing third dielectric film, or the transparent conductive film is deposited by sputtering from a target. Further thereto, a deposition apparatus () for manufacturing a transparent body for use in a touch panel and a transparent body for use in a touch panel are provided.

Method and system for manufacturing a transparent body for use in a touch panel

A layer stack for a touch panel is described. The layer stack includes a substrate including a polymer for depositing one or more layers on the substrate; a patterned transparent conductive oxide (TCO) layer provided over the substrate, which comprises areas of TCO and gaps between the areas of TCO; a first dielectric material provided in the gaps of the patterned TCO layer and a dielectric layer being deposited directly on the TCO areas of the TCO layer and directly on the first dielectric material. Further, a touch panel including a layer stack and a method for forming a layer stack for a touch panel is described.

Layer stack for a touch panel and method for forming a layer stack

A Fabry-Perot filter is applied as a thin coating on a film, for example, a packaging film, and permits interesting color effects. The coating has a layered construction in which both reflecting layers of the filter may be made of aluminum and the intermediate layer between the reflecting layers may be made of aluminum oxide.

Method for the application of a filter on a web

A linear plasma electron source is provided. The linear plasma electron source includes a housing acting as a first electrode, the housing having side walls a slit opening in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode being arranged within the housing and having a first side facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply for providing a gas into the housing.

Linear electron source, evaporator using linear electron source, and applications of electron sources

A method of charging a web or foil is described. The method includes guiding a web or foil having a thickness of 10 &#x3bc;m or larger with at least on roller; providing a linear electron source having a housing acting as an anode, the housing having side walls; a slit opening in the housing for trespassing of a linear electron beam, the slit opening defining a length direction of the source; a cathode being arranged within the housing and having a first side facing the slit opening; at least one gas supply for providing a gas into the housing; and a power supply for providing a high voltage between the anode and the cathode; and emitting the linear electron beam, wherein the high voltage is adjusted for providing an electron energy to implant electrons of the electron beam within the web or foil.

A system and method for producing electrons and ions are disclosed. One embodiment includes an outer electrode with a discharge chamber; an inner electrode positioned inside the discharge chamber, the inner electrode positioning forming a upper portion of the discharge chamber and a lower portion of the discharge chamber; and a gas inlet positioned in the lower portion of the discharge chamber; wherein a plasma formed within the lower portion of the discharge chamber provides priming particles usable to form a plasma in the upper portion of the discharge chamber.

System and method for generating ions and radicals

The present invention relates to a method of determining physical properties of an optical layer or layer system by means of spectral transmission and/or reflection measurements, whereby in accordance with the spectrum of the transmission and/or reflection measurement, reference values for the wavelength-dependent refractive indices nand/or extinction coefficients kare chosen from known values or are determined experimentally and the variation that characterizes the layer is described by wavelength-independent variation constants Kand Kfor the refractive indices and extinction coefficients.

Method of determining physical properties of an optical layer or layer system

A measuring device includes several sequentially disposed coating chambers for measuring optical properties of coated substrates. These coating chambers are separated from one another by partitioning walls, whose free ends are located closely above the substrate. The substrate is preferably a continuous film. By measuring the reflection, the transmission, etc. of the substrate between the individual coating chambers, it becomes possible to carry out measurements within only partially completed layer systems. This yields advantages for the technical operation control of the coating process.

Measuring device for the measurement of optical properties of coated substrates

A material with spectrally selective reflection in the primary valences of red, green and blue is applied preferably onto laser projection screens in order to make possible the projection even in daylight. In a first embodiment, a first layer of a material that is highly reflective over the entire range of visible light, e.g., aluminum is applied onto a substrate, e.g., glass or a synthetic material, followed by a second layer of a material that is essentially non-absorbing over the entire range of visible light, e.g., SiO. A third layer in contact with air is applied to the second layer and is made of a material that is partially transmissive over the entire range of visible light, e.g., of NiCr An alternative embodiment comprise five layers, The first layer is made a material with a high index of refraction, e.g.; TiO, a second of a material with a low index of refraction, e.g., SiO, the third of a material with a high index of refraction, e.g., TiO: a fourth of a material with a low index of refraction. e.g., SiO, and a fifth layer of a material with a high index of refraction, e.g., TiO.

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Gruendau-Rothenbergen, Germany

Hans-Georg Lotz