Asml Netherlands B.v.

Hans Erik Kattouw

Valerio Altini

Wim Tjibbo Tel

Bearrach Moest

Rene Oesterholt

Gerardus Carolus Johannus Hofmans

Jan Hauschild

Jacob Fredrik Friso Klinkhamer

Theo Wilhelmus Maria Thijssen

Jeffrey Godefridus Cornelis Tempelaars

A method for determining a correction for control of a lithographic process for exposing a pattern on an exposure field using a lithographic apparatus. The method including obtaining a spatial profile describing spatial variation of a performance parameter across at least a portion of the exposure field and co-determining control profiles for the spatial profile to minimize error in the performance parameter while ensuring a minimum contrast quality. The co-determined control profiles include at least a stage control profile for control of a stage arrangement of the lithographic apparatus and an optical element (e.g., lens) manipulator control profile for control of an optical element manipulator of the lithographic apparatus, the manipulator operable to perform a correction for at least magnification in a direction perpendicular to the substrate plane.

Sub-field control of a lithographic process and associated apparatus

A lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus has a controller configured to define a control grid associated with positioning of a substrate within the lithographic apparatus. The control grid is based on a device layout, associated with a patterning device, defining a device pattern which is to be, and/or has been, applied to the substrate in a lithographic process.

Lithographic process and apparatus and inspection process and apparatus

Calibration of spot height offsets in a level sensor is performed on a resist-coated substrate to eliminate process dependencies of substrate position measurements obtained by the level sensor.

Lithographic apparatus, calibration method, device manufacturing method and computer program product

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Arnhem, Netherlands

Hans Erik Kattouw