Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Asml Holding N.v.

Asm Lithography B.v.

Heinmade B.v.

Hans Butler

Erik Roelof Loopstra

Marc Wilhelmus Maria Van Der Wijst

Johannes Catharinus Hubertus Mulkens

Timotheus Franciscus Sengers

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Jeroen Johannes Sophia Maria Mertens

Joeri Lof

Helmar Van Santen

Alexander Straaijer

Klaus Simon

Joannes Theodoor De Smit

Hendricus Johannes Maria Meijer

Frank Van Schaik

Aleksey Yurievich Kolesnychenko

Roelof Aeilko Siebrand Ritsema

Engelbertus Antonius Fransiscus Van Der Pasch

Cornelius Adrianus Lambertus De Hoon

Bob Streefkerk

Erik Theodorus Maria Bijlaart

Maurice Willem Jozef Etiënne Wijckmans

Johannes Petrus Martinus Bernardus Vermeulen

Arie Jeffrey Den Boef

Marcus Adrianus Van De Kerkhof

Henrikus Herman Marie Cox

Joost De Pee

Joost Jeroen Ottens

Mark Kroon

Martinus Van Duijnhoven

Jeroen Pieter Starreveld

Paul Corné Henri De Wit

Bas Jansen

Marco Hendrikus Hermanus Oude Nijhuis

Martijn Houkes

Robertus Johannes Marinus De Jongh

Johan Hendrik Geerke

Jan-Gerard Cornelis Van Der Toorn

Koen Jacobus Johannes Maria Zaal

Harmen Klaas Van Der Schoot

Sven Antoin Johan Hol

Wilhelmus Franciscus Johannes Simons

Evert Hendrik Jan Draaijer

Francois Xavier Debiesme

Franciscus Adrianus Gerardus Klaassen

Frits Van Der Meulen

Theodorus Petrus Maria Cadee

Bernhard Geuppert

Jan Van Eijk

Anton Bernhard Van Oosten

Martinus Agnes Willem Cuijpers

Ramidin Izair Kamidi

Fransiscus Mathijs Jacobs

Sander Kerssemakers

Jeroen Arnoldus Leonardus Johannes Raaymakers

Marinus Petrus Reijnders

Niels Johannes Maria Bosch

Pieter Johannes Gertrudis Meijers

Clementius Andreas Johannes Beijers

Antonius Henricus Arends

Stijn Boschker

Nicolaas Ten Kate

Hans Jansen

Nicolaas Rudolf Kemper

Hugo Augustinus Joseph Cramer

Andre Bernardus Jeunink

Nitesh Pandey

Antonius Theodorus Anna Maria Derksen

Jan Bernard Plechelmus Van Schoot

Jacobus Johannus Leonardus Hendricus Verspay

Emiel Jozef Melanie Eussen

Antonius Franciscus Johannes De Groot

Adrianus Hendrik Koevoets

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Yang-Shan Huang

Michael Jozef Mathijs Renkens

Robertus Leonardus Tousain

Ferry Zijp

Duygu Akbulut

Marcel Koenraad Marie Baggen

Peter Paul Hempenius

Marinus Johannes Maria Van Dam

Minne Cuperus

Youssef Karel Maria De Vos

Wilhelmus Henricus Theodorus Maria Aangenent

Robbert Edgar Van Leeuwen

Frank Auer

Mark Johannes Hermanus Frencken

Christiaan Louis Valentin

Yim Bun Patrick Kwan

Olof Martinus Josephus Fischer

Marcus Emile Joannes Boonman

Marcus Joseph Elisabeth Godfried Breukers

Dick Antonius Hendrikus Laro

Lucas Kuindersma

Michael Johannes Christiaan Ronde

Joep Sander De Beer

Pavel Kagan

Thijs Verhees

Rodolfo Guglielmi Rabe

A metrology tool that includes a substrate table to hold a substrate; a projection system configured to project a beam on a target portion of the substrate; an actuator configured to adjust a position of the projection system relative to the substrate on the substrate table; a sensor configured to determine a position of the substrate table; and a one or more processors configured to: determine, based on the position of the substrate table, a position error of the substrate table with respect to a reference; and control, via the actuator, a position of the projection system to compensate for the position error of the substrate table so that the beam projects on the target portion of the substrate.

Metrology tool with position control of projection system

An actuator assembly including a first piezo actuator and a second piezo actuator. The piezo actuator has a correction unit configured to determine an output voltage difference representing a difference between a voltage at the output terminal of the first piezo actuator and a voltage at the output terminal of the second piezo actuator, and a first power correction for correcting the first power signal and/or a second power correction for correcting the second power signal, based on the output voltage difference.

Actuator assemblies comprising piezo actuators or electrostrictive actuators

A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.

Imprint apparatus with movable stages

A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

Metrology apparatus

A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.

Lithographic apparatus

An object table configured to hold an object on a holding surface, the object table including: a main body; a plurality of burls extending from the main body, end surfaces of the burls defining the holding surface; an actuator assembly; and a further actuator assembly, wherein the actuator assembly is configured to deform the main body to generate a long stroke out-of-plane deformation of the holding surface based on shape information of the object that is to be held and the further actuator assembly is configured to generate a short stroke out-of-plane deformation of the holding surface.

Object table, a stage apparatus and a lithographic apparatus

The invention relates to an object positioning system including an actuator system and a measurement system. The actuator system includes an actuator made of a material with predominantly electrostrictive properties and substantially no net polarization in absence of an electric field. The actuator system is configured to apply an electric field to the actuator, which electric field includes a bias electric field and an actuation electric field superimposed on the bias electric field, a field strength of the actuation electric field being equal to or smaller than a field strength of the bias electric field. The measurement system is configured to measure an electrical property of the actuator which is representative for a mechanical state of the actuator. The measurement system includes a bridge circuit including an actuator and a reference element having electrical properties matched to the electrical properties of the actuator.

Object positioning system diagnostic and calibration methods positioning control method lithographic apparatus and device manufacturing method

The invention relates to an electronic system for an accelerometer having a piezoelectric element and a first mechanical resonance frequency, comprising: a) a damping circuit configured to: &#x2014;receive an acceleration signal from the piezoelectric element; &#x2014;electronically dampen an amplitude of the first mechanical resonance frequency; and&#x2014;generate a damped acceleration signal, b) an extender configured to: &#x2014;receive the damped acceleration signal; &#x2014;extend the frequency response; and&#x2014;output an extended damped acceleration signal, wherein the extender is configured to have a first electronic anti-resonance frequency matching the damped first mechanical resonance frequency, and to have a frequency response between the first electronic anti-resonance frequency and a higher second frequency that is substantially opposite to a corresponding frequency response of the combination of the accelerometer and the damping circuit.

Electronic system, accelerometer, calibration method, lithographic apparatus and device manufacturing method

A lithographic apparatus comprises a projection system comprising position sensors to measure a position of optical elements of the projection system. The positions sensors are referenced to a sensor frame. Damping actuators damp vibrations of the sensor frame. A control device drives the actuators and is configured to derive sensor frame damping force signals from at least one of the acceleration signals and the sensor frame position signals, derive an estimated line of sight error from the position signals, determine actuator drive signals from the sensor frame damping force signals and the estimated line of sight error, drive the actuators using the actuator drive signals to dampen the sensor frame and to at least partly compensate the estimated line of sight error.

Lithographic apparatus and method

A lithographic apparatus (LA) applies a pattern to a substrate (W). The lithographic apparatus includes a height sensor (LS), a substrate positioning subsystem, and a controller configured for causing the height sensor to measure the height (h) of the substrate surface at locations across the substrate. The measured heights are used to control the focusing of one or more patterns applied to the substrate. The height h is measured relative to a reference height (zref). The height sensor is operable to vary the reference height (zref), which allows a wider effective range of operation. Specifications for control of the substrate height during measurement can be relaxed. The reference height can be varied by moving one or more optical elements (and/or) within the height sensor, or moving the height sensor. An embodiment without moving parts includes a multi-element photodetector ().

Height sensor, lithographic apparatus and method for manufacturing devices

The invention provides a substrate support arranged to support a substrate, comprising piezo a actuator, further comprising a first pair of electrodes, a second pair of electrodes and a piezo material having a first surface and a second surface. The first surface is arranged along a first direction and second direction. The first pair of electrodes comprises a first electrode arranged on the first surface and a second electrode arranged on the second surface. The second pair of electrodes is arranged to shear the piezo material. The first pair of electrodes is arranged to elongate the piezo material in a third direction perpendicular to the first direction and second direction. The first electrode is divided into at least two parts and is arranged to rotate the first surface and the second surface relatively to each other about the first direction wherein the piezo actuator is arranged to support the substrate.

Piezoelectric actuator, actuator system, substrate support, and lithographic apparatus including the actuator

An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.

Electron beam inspection apparatus stage positioning

A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.

Frame assembly, lithographic apparatus and device manufacturing method

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Hans Butler