Other

International Business Machines Corporation

Applied Materials Gmbh & Co Kg

Hans Buchberger

Klaus Goedicke

Torsten Winkler

Dieter Haas

Jörg Krempel-Hesse

Andreas Geiss

Michael Jungh&auml;hnel

Manfred M&uuml;ller

Arno Hebgen

Ralf Bluethner

Heinz Baur

Hans-Herrman Schneider

Hans-Hermann Schneider

Ralf Bl&uuml;thner

Michael Junghaehnel

Manfred Mueller

Karl-Heinz Lehnert

A machine for coating a transparent substrate for the production of display screens comprises a coating chamber that has a modular design. Each of the modulesfeatures a chamber section, a first supportthat is arranged removably in or at the chamber section, and a second supportthat is arranged removably at the first support. Whereas the first supportbears the cathodes, the second supportis formed as a cover at which are arranged the pumps for producing a vacuum in the coating chamber. Carriersandcan be removed laterally from the chamber sectionto such an extent that areasaccessible to persons can be formed between the module components. In this way, the components of the machine are readily accessible, for example for maintenance purposes. Work can be done simultaneously on the cathodes and in the chamber interior.

Machine for coating a substrate, and module

Production of a thin-film system containing at least one ultra-thin film, preferentially in the film thickness range from 1 to 10 nm, which is deposited by plasma-aided chemical or physical vapor-phase deposition using magnetron discharges. The method is characterized in that in the course of deposition of the ultra-thin film the power output is introduced into the plasma in the form of a controlled number of power pulses and that the average power output during the pulse-on time is set higher by a factor of at least 3 than the averaged power output over the entire coating time during deposition of the ultra-thin film.

Method of producing a thin-film system

A method of coating of thin film coated magnetic disks and thin film magnetic disks made thereby is described. In accordance with the invention, a barrier layer is deposited on the substrate before the underlayer film(s) to increase the corrosion resistance of metallic substrate magnetic disks and, in the case of nonmetallic substrates, to reduce the diffusion of water to the substrate and of freely moveable ions from the substrate. Preferably the barrier layer is deposited by medium frequency pulsed sputtering at a frequency of 10 to 200 kHz and a pulse length to pulse pause ratio from 5:1 to 1:10. Aluminum or chromium are the preferred materials for the barrier layer. Additional improvements may be achieved where the sputtering process gas contains a proportion of oxygen and/or nitrogen.

Thin film disk with barrier layer

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Kronberg, Germany

Hans Buchberger