Vistec Semiconductor Systems Gmbh

Hans-Artur Boesser

Michael Heiden

Klaus-Dieter Adam

Wolfgang Fricke

Klaus Rinn

Frank Laske

Walter Steinberg

Joerg Lenz

Gerhard Joseph Nickel

Siegfried Peter Kluge

An interferometric device for position measurement of an element moveable in a plane is disclosed. A laser light source measures the position of the moveable element and emits the required measuring light. A beam splitter splits the measuring light into a first partial beam path and a second partial beam path, which each impinge on a reflecting surface of the moveable element via an interferometer. Herein, at least the beam splitter, which splits the measuring light into a first partial beam path and a second partial beam path, and the beam splitter, which directs the third partial beam path onto an etalon via an interferometer, have a respective beam trap associated with them, which traps the light returning from the respective interferometers.

Interferometric device for position measurement and coordinate measuring machine

What is disclosed is a device () for automatic detection of a possible incorrect measurement, wherein the device () comprises at least one reflected light illumination apparatus () and/or a transmitted light illumination apparatus () and at least one imaging optical system () and one detector () of a camera () for imaging structures () on a substrate (), wherein a first program portion () is linked to the detector () of the camera (), said detector being provided for determining the position and/or dimension of the structure () on the substrate (), wherein the device () determines and records a plurality of measurement variables M, j&#x3b5;{1, . . . , L}, from which at least one variable G can be determined, wherein a second program portion () is linked to the detector () of the camera (), said program portion calculating an analysis of the measurement variables Mwith regard to a possible incorrect measurement. Also disclosed is a method for automatic detection of a possible incorrect measurement wherein an analysis of the measurement variables Mwith regard to a possible incorrect measurement is calculated with a second program portion () which is linked to the detector () of the camera ().

Device and method for automatic detection of incorrect measurements by means of quality factors

A measuring system is disclosed with enhanced resolution for periodic structures on a substrate for semiconductor manufacture. Aperture structures of varying geometries are provided in the illumination beam path. The aperture structures differ regarding the transmission characteristics of light, and which adjust the intensity distribution of the diffraction orders in the imaging pupil of the optical system.

Measuring system for structures on a substrate for semiconductor manufacture

A system and a method for determining positions of structures on a substrate are disclosed. The system includes at least one measurement table () movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective () and a camera for determining the positions of the structures () on the substrate (). The position of the measurement objective () and/or the measurement table () may be determined by at least one interferometer (). The system is surrounded by a housing representing a climatic chamber () provided with an active pressure regulation.

System and method for determining positions of structures on a substrate

A coordinate measuring machine () for measuring structures () on a substrate () including a measurement table () movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective (), at least one laser interferometer () for determining the position of the measurement table () and the measurement objective () wherein the measurement table (), the measurement objective () and the at least one laser interferometer () are arranged in a vacuum chamber ().

Coordinate measuring machine for measuring structures on a substrate

A coordinate measuring machine () including a plane () in which there is arranged a movable measurement table () moving the mask () correspondingly in the plane (), at least one objective () and a detector (), an incident light source () arranged to provide incident light and/or a transmitted light source () arranged to provide transmitted light, wherein the mask () has at least a first area () and a second area (), wherein the first area () and the second area () comprise different materials differing in their transmission or reflection properties.

Device and method for determining an optical property of a mask

A method for determining the focal position of at least two edges of structures () on a substrate () is disclosed. During the movement of a measurement objective () in the Z-coordinate direction, a plurality of images of the at least one structure () is acquired with at least one measurement window () of a detector. An intensity profile of the structure () is determined for each image.

Method for determining the focal position of at least two edges of structures on a substrate

A measuring apparatus for determining relative positions of a positioning stage arranged in a moveable fashion in at least one direction by a predeterminable maximum traversing path. The measuring device comprises at least one interferometric measuring means and at least one interferometric correction means. An interferometric measuring means is operable with the laser light of a laser of at least one wavelength. Correction results can be generated with the interferometric correction means allowing conclusions to be drawn with respect to the actual wavelength of the laser light during a position determination of the positioning stage in order to take into account variations of the wavelength of the laser light, in particular due to ambient conditions, when evaluating the measuring results. The interferometric correction means is arranged proximate to the interferometric measuring means, and the proximity corresponds to a predeterminable portion of the maximum traversing path of the positioning stage.

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Breidenbach, Germany

Hans-Artur Boesser