National Institute of Advanced Industrial Science and Technology

Hanpei Koike

Toshihiro Sekigawa

Meishoku Masahara

Yongxun Liu

Yohei Matsumoto

Hiroyuki Ota

Shinichi Ouchi

Tetsuji Yasuda

Tadashi Nakagawa

Kazuhiko Endo

Toshihiro Katashita

Eiichi Suzuki

Tatsuro Maeda

Yohei Hori

Koichi Fukuda

Masakazu Hioki

Yasuhiro Ogasahara

Toshifumi Irisawa

A semiconductor deviceof the present invention includes a front end and back ends A and B, each including a plurality of layers. Further, in the plurality of layers of the back end B, (i) circuits, andhaving a security function are provided in at least one layer having a wiring pitch of 100 nm or more, (ii) a circuit having a security function is provided in at least one wiring layer in M5 or higher level (M5, M6, M7, . . . ), (iii) a circuit having a security function is provided in at least one layer, for which immersion ArF exposure does not need to be used, or (iv) a circuit having a security function is provided in at least one layer that is exposed by using an exposure wavelength of 200 nm or more.

Semiconductor device including circuit having security function

The multiplexer includes a plurality of transmission gates each formed by four-terminal double insulated gate N-type and P-type field effect transistors connected in parallel. One of gates of the N-type gate field effect transistor is connected to a first threshold voltage control node, and a first resistor is connected between the first threshold voltage control node and a first threshold voltage control voltage source. One of gates of the P-type gate field effect transistor is connected to a second threshold voltage control node, and a second resistor is connected between the second threshold voltage control node and a second threshold voltage control voltage source.

Multiplexer and integrated circuit using the same

The present invention provides an SRAM cell which does not have the constraints on the size of transistors in order to realize stabilized write and read operations, which has a fewer number of control signal lines per port, and which can be easily multi-ported in the read operation as well as the write operation so that the write and read operations can be performed through a single bit line. The SRAM cell includes a feedback control transistor for controlling connection or disconnection of a positive feedback circuit between particularly two inverters, a write control transistor and a read control transistor connected to a single bit line, and a read buffer transistor connected to the read control transistor.

SRAM cell

The purpose of the present invention is to realize reduction of power consumption of reconfigurable integrated circuits such as FPGAs by decreasing leakage current in SRAMs. A reconfigurable integrated circuit is provided which includes transistors and comprises a first switch with an input terminal, an output terminal, and a control terminal, a first memory with a memory cell connected to the control terminal of the first switch, a second switch capable of shutting down a power supply line or a ground line of the first memory, and a second memory to control the second switch, wherein a value to open the second switch is written into the second memory when the first switch is not operated, thereby shutting down the power supply line or the ground line of the first memory.

Reconfigurable integrated circuit

With respect to the reconfigurable integrated circuit, a system for configuring an integrated circuit and a configuration method thereof which do not need a circuit overhead for variation correction and diagnosis of variation are provided. A system for configuring an integrated circuit comprises a reconfigurable integrated circuit, a memory device for configuringwhich holds a plurality of different circuit configurations to be realized on the reconfigurable integrated circuit, the circuit configurations having identical functions but having different performance depending on different probability variables, memory device for testingwhich holds test data to be achieved by the circuit configuration for the respective function, and a test devicefor performing a test based on the test data.

System for configuring an integrated circuit and method thereof

In a double-gate MOS transistor, a substrate, an insulating layer, and a semiconductor layer are formed or laminated in that order, an opening extending to the insulating layer is formed in the semiconductor layer while leaving an island-shaped region, the island-shaped region including a semiconductor crystal layer having a predetermined length and height and a predetermined shape of horizontal section, the semiconductor crystal layer including P-type or N-type source region, channel region, and drain region, in that order, formed therein, a source electrode, gate electrodes, and a drain electrode are provided in contact with side surfaces of the respective regions, and the gate electrodes are provided in contact with the side surfaces of the channel region.

Double-gate MOS transistor, double-gate CMOS transistor, and method for manufacturing the same

It is an object of the present invention to provide a CMOS circuit implemented using four-terminal double-insulated-gate field-effect transistors, in which the problems described above can be overcome. Another object of the present invention is to reduce power consumption in a circuit unit that is in an idle state or ready state, i.e., to reduce static power consumption. The two gate electrodes of a P-type four-terminal double-insulated-gate field-effect transistor are electrically connected to each other and are electrically connected to one of the gate electrodes of an N-type four-terminal double-insulated-gate field-effect transistor, whereby an input terminal of a CMOS circuit is formed, and a threshold voltage of the N-type four-terminal double-insulated-gate field-effect transistor is controlled by controlling a potential of the other gate of the N-type four-terminal double-insulated-gate field-effect transistor.

CMOS circuit including double-insulated-gate field-effect transistors

In an insulated double gate FET, the threshold voltage during the operation of a transient response thereof is enabled to be arbitrarily and accurately controlled by a method that includes applying a first input signal intended to perform an ordinary logic operation to one of the gate electrodes thereof and applying, in response to this signal, a second signal that has a signal-level temporal-change direction as the first input signal and has at least one of the low level and the high level thereof shifted by a predetermined magnitude or endowed with a predetermined time difference or has the time slower or faster signal level change of the signal to the other gate electrode.

Growing community of inventors

Tsukuba, Japan

Hanpei Koike