United Microelectronics Corp.

Han-Lin Zeng

En-Chiuan Liou

Chia-Hung Lin

Chun-Chi Yu

Yi-Jing Wang

Mei-Chen Chen

The present invention provides an overlay target. The overlay target includes a plurality of first pattern blocks and a plurality of second pattern blocks. The first pattern blocks and the second patterns blocks are arranged in array by being separated by at least one first gaps stretching along a first direction and at least one second gaps stretching along a second direction. Each first pattern block is composed of a plurality of first stripe patterns stretching along a third direction, and each second pattern block is composed of a plurality of second stripe patterns stretching along a fourth direction. The first direction is orthogonal to the second direction, the third direction and the fourth direction are 45 degrees relative to the first direction.

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Tainan, Taiwan

Han-Lin Zeng