Asml Netherlands B.v.

Han Henricus Aldegonda Lempens

Theodorus Wilhelmus Polet

Koen Steffens

Wilhelmus Franciscus Johannes Simons

Patrick Johannes Wilhelmus Spruytenburg

Erik Henricus Egidius Catharina Eummelen

Giovanni Luca Gattobigio

Ronald Van Der Ham

Johannes Cornelis Paulus Melman

Paulus Martinus Maria Liebregts

Cornelius Maria Rops

Marcio Alexandre Cano Miranda

Paul Petrus Joannes Berkvens

Miao Yu

Gert-Jan Gerardus Johannes Thomas Brands

Christophe De Metsenaere

Joris Johan Anne-Marie Verstraete

Johannes Henricus Wilhelmus Jacobs

Franciscus Johannes Joseph Janssen

Ruud Hendrikus Martinus Johannes Bloks

Ruud Olieslagers

Mathieus Anna Karel Van Lierop

Artunç Ulucan

Christiaan Alexander Hoogendam

Michel Riepen

Raymond Wilhelmus Louis Lafarre

Thibault Simon Mathieu Laurent

Martijn Houben

Rogier Hendrikus Magdalena Cortie

Siegfried Alexander Tromp

Jim Vincent Overkamp

Gerben Pieterse

Daniel Jozef Maria Direcks

Koen Cuypers

Jorge Alberto Vieyra Salas

Eva Mondt

John Maria Bombeeck

Daniël Jozef Maria Direcks

Van Vuong Vy

Frank Debougnoux

Johannes Jacobus Matheus Baselmans

Nicolaas Rudolf Kemper

Roelof Frederik De Graaf

Theodorus Marinus Modderman

Ferdy Migchelbrink

Gheorghe Tanasa

Danny Maria Hubertus Philips

Pieter Mulder

Hrishikesh Patel

Paul William Scholtes-Van Eijk

Bart Smeets

Marcus Johannes Van Der Zanden

Willem Jan Bouman

Matheus Anna Karel Van Lierop

Petrus Martinus Gerardus Johannes Arts

Maarten Holtrust

Gert-Jan Geradus Johannes Thomas Brands

An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

Lithography apparatus and a method of manufacturing a device

Lithography apparatus and device manufacturing method

An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

Fluid handling structure and lithographic apparatus

A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.

Cleaning device and method of cleaning

An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

Object holder and lithographic apparatus

A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

Lithographic apparatus and device manufacturing method

An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.

Immersion lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.

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Weert, Netherlands

Han Henricus Aldegonda Lempens