Samsung Electronics Co., Ltd.

Wonik Materials

Han-dock Song

Tae-Hyung Kim

Do-hoon Kim

Jong-min Baek

An etching gas mixture, a method of forming a pattern using the etching gas mixture, and a method of manufacturing an integrated circuit device using the etching gas mixture, the etching gas mixture including a C1-C3 perfluorinated alkyl hypofluorite; and a C1-C10 organosulfur compound that includes a C&#x2014;S bond in the compound.

Etching gas mixture, method of forming pattern by using the same, and method of manufacturing integrated circuit device by using the etching gas mixture

Growing community of inventors

Cheongju-si, South Korea

Han-dock Song