Gigaphoton Inc.

Komatsu Corporation

Kabushiki Kaisha Komatsu Seisakusho

Other

Ushio Denki Kabushiki Kaisha

Hakaru Mizoguchi

Osamu Wakabayashi

Kouji Kakizaki

Junichi Fujimoto

Tatsuya Yanagida

Tsukasa Hori

Hideo Hoshino

Toshihiro Nishisaka

Yoshiho Amada

Tatsuo Enami

Masato Moriya

Takayuki Yabu

Shinji Nagai

Takashi Suganuma

Akira Endo

Tamotsu Abe

Takanobu Ishihara

Hiroaki Tsushima

Akira Sumitani

Takeshi Asayama

Kiwamu Takehisa

Hiroshi Umeda

Hiroshi Komori

Noritoshi Ito

Akira Egawa

Masahiro Inoue

Hiroshi Someya

Yasufumi Kawasuji

Teiichirou Chiba

Takashi Matsunaga

Takashi Saito

Masahiko Kowaka

Koji Kakizaki

Hirokazu Tanaka

Kiyoharu Nakao

Natsushi Suzuki

Yukio Kobayashi

Hidenobu Kameda

Hisashi Nara

Hiroaki Nakarai

Shinji Okazaki

Katsutomo Terashima

Akira Okamoto

Kazuya Takezawa

Naoki Kataoka

Minoru Taniyama

Yoichi Sasaki

Taku Yamazaki

Tatsumi Gotou

Tomokazu Takahashi

Tatsuo Mimura

Ryoichi Nodomi

Tatsuya Ariga

Kiyonori Matsuno

A laser device according to an aspect of the present disclosure includes a chamber into which laser gas is introduced; a pair of electrodes arranged in the chamber; a power source configured to apply a voltage between the electrodes; a nozzle structure which includes an internal passage for receiving the laser gas and a slit connected to the internal passage and is configured to generate flow of the laser gas between the electrodes due to the laser gas blowing out from the slit; a gas flow path which has a suction port through which the laser gas in the chamber is suctioned and introduces, to the nozzle structure, the laser gas suctioned through the suction port; and a blower device configured to cause the laser gas to blow toward the internal passage of the nozzle structure through the gas flow path.

Laser device and electronic device manufacturing method

A laser unit may include a laser chamber including a pair of discharge electrodes that are opposed to each other in a first direction with an electrode gap interposed in between and are configured to provide a discharge width in a second direction, orthogonal to the first direction, smaller than the electrode gap; and an optical resonator including a first optical member and a second optical member that are opposed to each other in a third direction orthogonal to both the first direction and the second direction with the discharge electrodes interposed in between, and configured to amplify laser light generated between the discharge electrodes and output amplified laser light, the optical resonator satisfying the following expression to configure a stable resonator in the second direction:0&#x3c;1&#xb7;2&#x3c;1

Laser unit

A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

System and method for generating extreme ultraviolet light

There is provided a laser unit that may include: a master oscillator configured to output a linear-polarized laser light beam; a first polarization device disposed in a light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a polarization direction of the linearly-polarized incident laser light beam; a second polarization device disposed in the light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a direction of the polarization axis of the first polarization device; and a laser amplifier disposed between the first polarization device and the second polarization device in the light path of the linear-polarized laser light beam and including a pair of discharge electrodes disposed to oppose each other, an opposing direction of the pair of discharge electrodes being substantially aligned with the direction of the polarization axis of the first polarization device.

Laser unit and extreme ultraviolet light generating system

Provided is an extreme ultraviolet light generating apparatus that may include: a chamber containing one or more kinds of gases; a light concentration optical system provided in an optical path of pulsed laser light outputted from a laser unit, and configured to concentrate the pulsed laser light into a concentrated beam; and an image pickup section provided at a position out of the optical path of the pulsed laser light, and configured to pick up a plasma emission image that is an image of plasma emission in the chamber. The plasma emission is caused by application of the concentrated beam to the one or more kinds of gases in the chamber.

Extreme ultraviolet light generating apparatus, method of generating extreme ultraviolet light, concentrated pulsed laser light beam measuring apparatus, and method of measuring concentrated pulsed laser light beam

A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.

Two-beam interference apparatus and two-beam interference exposure system

A cleaning method for an EUV light generation apparatus may include closing a connection portion so that a chamber interior and the interior of an exposure apparatus do not communicate when EUV light is not being generated, supplying an etchant gas for etching debris that has accumulated on a reflective surface of an optical element to the chamber interior in a state where the connection portion is closed, and exhausting the chamber interior using an exhaust apparatus while supplying the etchant gas.

Cleaning method for EUV light generation apparatus

An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.

Extreme ultraviolet light generation system

There is provided a laser chamber housing a pair of discharge electrodes and a gas circulation fun, the laser chamber including: a magnetic bearing configured to support a shaft of the gas circulation fan, with the shaft being in non-contact with the magnetic bearing; and a touchdown bearing configured to operate as a bearing when the magnetic bearing is uncontrollable, the touchdown bearing being provided with solid lubricant configured of one or more of an Au plating layer, a Ni-containing plating layer, and a Cu plating layer.

Laser chamber and discharge excitation gas laser apparatus

An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.

Optical device, laser apparatus, and extreme ultraviolet light generation system

A laser apparatus according to embodiments may include a laser chamber including a laser gain medium; a power source; a first electrode to which a voltage is applied from the power source and a second electrode that is grounded, the first and second electrodes being disposed in the laser chamber; and a connector connected to the power source, and supporting the first electrode in a way that allows the first electrode to move toward a side where the second electrode is disposed.

Laser apparatus

Growing community of inventors

Oyama, Japan

Hakaru Mizoguchi