Samsung Electronics Co., Ltd.

Hak-Young Kim

Doug-Yong Sung

Ji-Hee Kim

Seong-Chul Choi

Bo-Ra Yoon

Jun-Ho Im

Kyeong-Seok Jeong

Go-Hyun Kim

Bi-Ah Shin

Jin-Hyeung Jang

Ji-Myoung Lee

A temperature controller of a plasma processing apparatus, a temperature measurer for a plasma processing apparatus, and a plasma processing apparatus, the temperature controller including a movable cooling plate configured to selectively contact a dielectric window in a plasma chamber, the cooling plate having at least one cooling groove through which a cooling agent for cooling the dielectric window is flowable; at least one cooling port including a cooling passageway that is connected to the at least one cooling groove; and a resilient member configured to resiliently press the cooling port toward the cooling plate such that the cooling plate is relatively movable with respect to the dielectric window.

Temperature controller, temperature measurer, and plasma processing apparatus including the same

A plasma processing device is provided. The plasma processing device includes a plate formed between a window covering a top portion of a chamber where plasma processing is performed and an antenna generating a magnetic field, and a fluid supply unit supplying a fluid for controlling temperatures of the window and the antenna, wherein the plate includes first and second regions supplied with the fluid, and the fluid supply unit independently controls the first and second regions.

Plasma processing device

A rotary shaft and a rotating body are connected in such a way as to stably control the tilt of a wafer platen in an ion implanter. The rotary shaft has a key way and the rotating body has a boss into which the rotary shaft extends. A key integrates the rotary shaft and the rotary body so that they rotate together without slipping relative to each other. An end cap is screwed onto the rotary body over the end of the rotary shaft and the key. As a result, the wafer platen can be maintained at an accurate orientation or tilt relative to the ion beam produced by the implanter.

System in which a rotating body is connected to a rotary shaft in an ion implanter

Growing community of inventors

Bucheon-si, South Korea

Hak-Young Kim