Mitsubishi Electric Corporation

Tokyo Electron Limited

Panasonic Intellectual Property Management Co., Ltd.

Tokyo Keiki Inc.

Olympus Corporation

Ajinomoto Co., Ltd.

Tomy Incorporated

Hajime Tamura

Yasuharu Sasaki

Shin Yamaguchi

Tsuguto Sugawara

Hiroaki Yoshio

Tatsuya Inoue

Ryo Eguchi

Katsuyuki Koizumi

Kazuki Maeno

Hirokazu Tanaka

Yoshiaki Ito

Hiroaki Saito

Kazushi Kaneko

Katsuji Aoki

Shin Yamada

Hajime Tanabe

Yasunobu Ogura

Sonoko Hirasawa

Takayuki Matsukawa

Yohei Ishida

Naoki Iwamoto

Hideya Kitagawa

Taro Iede

Masashi Miyazawa

Katsuo Iizumi

Kaori Mori

Shoichi Yokoyama

Kiyoshi Shiga

Shunichi Hirano

Takayuki Ushikubo

Nobuyuki Yamaya

Yoshikazu Takayanagi

Masayuki Kawaura

Koichi Murai

The disclosed substrate support includes a first region, a second region, a first electrode, and a second electrode. The first region is configured to hold a substrate placed thereon. The second region is provided to surround the first region and configured to hold an edge ring placed thereon. The first electrode is provided in the first region to receive a first electrical bias. The second electrode is provided in at least the second region to receive a second electrical bias. The second electrode extends below the first electrode to face the first electrode within the first region.

Substrate support and plasma processing apparatus

A plasma processing apparatus includes a plasma processing chamber; a base disposed in the plasma processing chamber; an electrostatic chuck, disposed on the base, having a substrate support portion and an edge ring support portion on which an edge ring is disposed so as to surround a substrate; a first clamping electrode disposed in the substrate support portion; a first bias electrode disposed below the first clamping electrode in the substrate support portion; a second clamping electrode disposed in the edge ring support portion; a second bias electrode disposed below the second clamping electrode in the edge ring support portion; a first power source electrically connected to the first bias electrode; and a second power source electrically connected to the second bias electrode.

Stage and plasma processing apparatus

A substrate support includes a substrate supporting surface, an electrode, a power supply line, and a power supply terminal. The electrode is disposed below the substrate supporting surface and configured to provide a bias power. The power supply line is disposed below the electrode and configured to apply the bias power to the electrode. The power supply terminal is configured to electrically couple the electrode and the power supply line. Further, an area of a surface of the power supply terminal that is coupled to the electrode is greater than an area of a surface of the power supply terminal that is coupled to the power supply line.

A passage propriety assessment device, provided with: a assessment unit that authorizes a person to pass through a first entrance/exit when a first facial image of the person at the first entrance/exit satisfies an individual authorization criterion, which is a criterion for assessing by facial recognition that the person is a pass-authorized person; and a setting unit that, when it is assessed that a person who has been authorized to pass through the first entrance/exit is impersonating a pass-authorized person, sets the individual authorization criterion for a pass-authorized person for a second entrance/exit located after the first entrance/exit so as to be higher than the individual authorization criterion for the first entrance/exit. When a second facial image of a person at the second entrance/exit does not satisfy the individual authorization criterion that was set higher, the assessment unit restricts the person from passing through the second entrance/exit.

Passage propriety assessment device, passage management system, passage propriety assessment method, and computer program

A substrate stage includes: a base portion having a mounting surface; an annular support configured to support a substrate; an annular partition wall configured to divide the mounting surface into an outer region and an inner region in a radial direction of the substrate; a plurality of protrusions provided on the mounting surface and configured to support the substrate with a gap left between an upper end surface of the partition wall and the substrate; an outer flow path in communication with the outer region, and configured to allow a heat transfer gas supplied to a space between the substrate and the mounting surface to flow therethrough; an inner flow path in communication with the inner region, and configured to allow the heat transfer gas to flow therethrough; and an annular diffusion portion configured to diffuse the heat transfer gas along a circumferential direction of the partition wall.

Substrate stage, substrate processing apparatus, and temperature control method

A device includes a microwave generator configured to generate a microwave having a bandwidth, an output unit, a directional coupler and a measurer. The microwave generator generates a microwave a power of which is pulse-modulated to be a High level and a Low level. A set carrier pitch is set to satisfy a preset condition. The preset condition includes a condition that a value obtained by dividing a set pulse frequency by the set carrier pitch or a value obtained by dividing the set carrier pitch by the set pulse frequency is not an integer and a condition that an ON-time of the High level is equal to or larger than 50%. The microwave generator averages a first High measurement value and a first Low measurement value in a preset moving average time longer than a sum of the ON-time of the High level at a preset sampling interval.

Microwave output device and plasma processing apparatus

A stage includes an electrostatic chuck that supports a substrate and an edge ring; and a base that supports the electrostatic chuck. The electrostatic chuck includes a first region having a first upper surface and supports the substrate placed on the first upper surface; a second region having a second upper surface, provided integrally around the first region, and supports the edge ring placed on the second upper surface; a first electrode provided in the first region to apply a DC voltage; a second electrode provided in the second region to apply a DC voltage, and a third electrode to apply a bias power.

An authentication device includes an acquisition unit that acquires first image data generated at a first timing and indicating a first face of a living creature to be authenticated, age information indicating an age of the living creature at the first timing, second image data generated at a second timing later than the first timing and indicating a second face of the living creature, and aging information indicating a time period from the first timing to the second timing, and a controller that compares the first image data with the second image data. The controller calculates a similarity between the first face and the second face based on the first image data and the second image data, corrects the similarity based on the age information and the aging information, and determines, based on the corrected similarity, whether the living creature in the first image data is identical to the living creature in the second image data.

Authentication device, authentication system, authentication method, and program

An amplification apparatus includes: a signal splitter for splitting an input radio frequency signal and outputting the resulting split radio frequency signals; a plurality of amplifier units for amplifying the radio frequency signals outputted from the signal splitter, the amplifier units being disposed circularly to form a generally cylindrical shape; a plurality of water cooling heat sinks disposed circularly at positions corresponding to the positions of the plurality of amplifier units so as to cool the plurality of amplifier units by cooling water; and a signal combiner for combining the radio frequency signals outputted from the plurality of amplifier units, respectively, and outputting the resulting combined radio frequency signal.

Amplification apparatus

A superconducting magnet device with which device breakage caused by a quench can be avoided while helium consumption is reduced. A sheet-like convection-preventing member is disposed at least either above or below a heat transfer member transferring to gaseous helium heat transferred from the outside, so as to cover a helium gas release tube for the gaseous helium, and thus heat exchange performance during transportation is improved. In the case where the quench occurs, the convection-preventing member is lifted upward in the release tube, thereby ensuring to provide a flow path for the gaseous helium and avoiding excessive increase of the internal pressure.

Superconducting magnet device

In order to eliminate erroneous detection in a case where a plurality of facial regions are detected in a captured image, facial detection device () of the present disclosure is a facial detection device that detects a facial region of a person from captured images which are continuous in time series, including a processor () that performs facial detection processing of detecting the facial region from the captured images and error determination processing of calculating a moving direction of each facial region between the captured images that are sequential in time series, and determining whether or not the detection as a facial region is correct with respect to a plurality of facial regions in which a correlation degree in the moving directions of the facial regions is equal to or larger than a predetermined threshold value, in a case where a plurality of facial regions are detected.

Facial detection device, facial detection system provided with same, and facial detection method

A superconducting magnet includes: a superconducting coil; a coolant container; a radiation shield; a vacuum container; a refrigerator configured to cool the inner part of the coolant container and the radiation shield; a first exhaust pipe connected to the coolant container from the outside of the vacuum container and serving as a flow path of the coolant vaporized; a first pressure release valve connected to a distal end of the first exhaust pipe outside the vacuum container and configured to open when a pressure in the coolant container becomes a first set value or higher; a heater provided at the first exhaust pipe and configured to heat the first exhaust pipe; and a detector provided at the first exhaust pipe and configured to detect a change due to occurrence of freezing in the first exhaust pipe.

Superconducting magnet

Growing community of inventors

Tokyo, Japan

Hajime Tamura