Tokyo Electron Limited

Haixing Zou

Junwei Bao

Yan Chen

Hanyou Chu

Ching-Ling Meng

Holger Tuitje

Mihail Mihaylov

Zheng Yan

Disclosed is a method, computer method, system, and apparatus for measuring two-dimensional distributions of optical emissions from a plasma in a semiconductor plasma processing chamber. The acquired two-dimensional distributions of plasma optical emissions can be used to infer the two-dimensional distributions of concentrations of certain chemical species of interest that are present in the plasma, and thus provide a useful tool for process development and also for new and improved processing tool development. The disclosed technique is computationally simple and inexpensive, and involves the use of an expansion of the assumed optical intensity distribution into a sum of basis functions that allow for circumferential variation of optical intensity. An example of suitable basis functions are Zernike polynomials.

Spatially resolved optical emission spectroscopy (OES) in plasma processing

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San Jose, CA, United States of America

Haixing Zou