Samsung Electronics Co., Ltd.

Haisub Na

Hyunwoo Kim

Su Jin Kim

Su-Min Park

Hyojin Yun

So-Ra Han

Min Ju Park

Kyoungseon Kim

Provided is a method of fabricating a semiconductor device. The method includes forming an anti-reflection layer on a lower layer, forming photoresist patterns on the anti-reflection layer, forming protection patterns to cover the photoresist patterns, respectively, etching the anti-reflection layer using the photoresist patterns covered with the protection patterns as an etch mask to form anti-reflection patterns, forming spacers to cover sidewalls of the anti-reflection patterns, and removing the anti-reflection patterns.

Method of forming fine patterns in an anti-reflection layer for use as a patterning hard mask

Growing community of inventors

Seoul, South Korea

Haisub Na