Applied Materials Israel Limited

Applied Materials, Inc.

Other

Technion Research & Development Foundation Ltd

Applied Materials Isreal Ltd

Haim Feldman

Ron Naftali

Boris Golberg

Emanuel Elyasaf

Avishay Guetta

Silviu Reinhorn

Doron Shoham

Gilad Almogy

Amir Shoham

Ido Almog

Yoav Berlatzky

Doron Meshulach

Ido Dolev

Nissim Elmaliach

Adam Baer

Simon Yalov

Eitan Lahat

Yoram Uziel

Roman Kris

Alexander Libinson

Meir Aloni

Doron Korngut

Amir Moshe Sagiv

Eyal Neistein

Moshe Langer

Harel Ilan

Roman Naidis

Shahar Arad

Boris Morgenstein

Dan Grossman

Avishai Bartov

Boris Goldberg

Daniel I Some

Ofer Adan

Ori Golani

Yoav Shechtman

Ofer Shneyour

Kobi Kan

Ori Sarfaty

Ron Bar-or

Eyal Angel

Erez Admoni

Ofer Kadar

Lev Haikoviz

Amir Komeem

Uriel Malul

A polarizer system is described. The polarizer system comprises at least one polarization beam splitter, a polarization rotator, and a beam combiner. The at least one polarization beam splitter is positioned to receive input radiation beam and to split the input radiation beam directing a first beam portion having a first linear polarization orientation along a first path and a second beam portion having a second linear polarization orientation orthogonal to said first linear polarization orientation along a second path. The polarization rotator is located along said second path and configured to rotate polarization of said beam portion to be parallel to said first linear polarization orientation. The beam combiner is configured and positioned to combine said first and second beam portions to form a common beam having said first linear polarization orientation propagating along a selected optical path.

Polarization optical system

Disclosed herein is a method for detecting defects on a sample. The method includes obtaining scan data of a region of a sample in a multiplicity of perspectives, and performing an integrated analysis of the obtained scan data. The integrated analysis includes computing, based on the obtained scan data, and/or estimating cross-perspective covariances, and determining presence of defects in the region, taking into account the cross-perspective covariances.

Multi-perspective wafer analysis

A system that may include a radiation source to generate a beam of coherent radiation; traveling lens optics to focus the beam to generate multiple spots on a surface of a sample and to scan the spots together over the surface; collection optics to collect the radiation scattered from the multiple spots and to focus the collected radiation to generate a pattern of interference fringes; and a detection unit to detect changes in the pattern of interference fringes.

System and method for defect detection using multi-spot scanning

A method for inspecting a three dimensional structure of a microscopic scale of a sample, the method may include obtaining an image of the three dimensional structure; obtaining a reference image of a reference three dimensional structure, the reference three dimensional structure and the three dimensional structure are ideally identical to each other; wherein each one of the image and the reference image was generated using optics that includes a phase mask, wherein the phase mask virtually expands a depth of field of the optics by encoding depth information over a depth range that exceeds the depth of field; generating a difference image that represents a difference between the image and the reference image; determining, based on the difference image, whether there is at least one defect in the three dimensional structure; wherein when determining that there is the at least one defect then providing a depth of the at least one defect.

Inspection of a three dimensional structure of a sample using a phase shift mask

A method, system and computer readable medium for providing information about a region of a sample. The method includes (i) obtaining, by an imager, multiple images of the region; wherein the multiple images differ from each other by at least one parameter (ii) receiving or generating multiple reference images; (iii) generating multiple difference images that represent differences between the multiple images and the multiple reference images; (iv) calculating a set of region pixel attributes, (v) calculating a set of noise attributes, based on multiple sets of region pixels attributes of the multiple region pixels; and (vi) determining for each region pixel, whether the region pixel represents a defect based on a relationship between the set of noise attributes and the set of region pixel attributes of the pixel.

Computerized system and method for obtaining information about a region of an object

An illumination module that includes a pair of anamorphic prisms that comprises a first anamorphic prism and a second anamorphic prism; wherein the pair of anamorphic prisms is configured to (a) receive a first radiation beam that propagates along a first optical axis, and (b) asymmetrically magnify the first radiation beam to provide a second radiation beam that propagates along a second optical axis that is parallel to the first optical axis; and a rectangular prism that is configured to receive the second radiation beam and perform a lateral shift of the second radiation beam to provide a third radiation beam; and a rotating mechanism that is configured to change an asymmetrical magnification of the pair of anamorphic prisms by rotating at least one of the first anamorphic prism and the second anamorphic prism.

Asymmetrical magnification inspection system and illumination module

A system that may include a radiation source to generate a beam of coherent radiation; traveling lens optics to focus the beam so as to generate multiple spots on a surface of a sample and to scan the spots together over the surface; collection optics to collect the radiation scattered from the multiple spots and to focus the collected radiation so as to generate a pattern of interference fringes; and a detection unit to detect changes in the pattern of interference fringes.

A method for determining a distance between a near field sensor and a substrate, the method may include creating a diffraction pattern by illuminating, with a beam of coherent radiation having a wavelength that does not exceed twenty nanometers, a slit that is formed between the substrate and an opaque element; detecting, by a detector, multiple portions of the diffraction pattern and generating detection signals indicative of the multiple portions of the diffraction pattern; processing the detection signals to determine a height of the slit; and determining the distance between the near field sensor and the substrate based upon (a) the height of the slit, and (b) a relationship between the height of the slit and a location of the near field sensor.

Near-field sensor height control

There may be provided an evaluation system that may include spatial sensors that include atomic force microscopes (AFMs) and a solid immersion lens. The AFMs are arranged to generate spatial relationship information that is indicative of a spatial relationship between the solid immersion lens and a substrate. The controller is arranged to receive the spatial relationship information and to send correction signals to the at least one location correction element for introducing a desired spatial relationship between the solid immersion lens and the substrate.

Evaluation system and a method for evaluating a substrate

A system, including an illumination module that comprises (a) a first traveling lens acousto-optic device; (b) a light source for illuminating the first traveling lens to provide an input beam that propagates along a first direction; (c) illumination optics for outputting an output beam that scans the object at a second direction; a detection unit; and a collection module for collecting a collected beam from the object, wherein the collected beam propagates along a third direction; and optically manipulating the collected beam to provide a counter-scan beam is directed towards the detection unit and has a focal point that is positioned at a same location regardless of the propagation of the collected beam along the third direction.

Systems and methods for inspecting an object

An on-tool measurement system and a method for measuring optical system's wavefront (WF) aberrations are disclosed. The on-tool measurement system includes an optical setup comprising a moveable deflection element further comprising a highly transparent region. The deflection element includes a first surface configured to project a first image of at least one object onto a sensor and the highly transparent region includes a second surface configured to project a second image of the at least one object onto the sensor. The on-tool measurement system includes a sensor configured to capture the first and second images and a controller configured to measure differential displacements between the first and second images at each deflection element position and to calculate the optical setup local WF gradients that depend on the measured differential displacements.

On-tool wavefront aberrations measurement system and method

A method and an inspection system that exhibiting speckle reduction characteristics includes a light source arranged to generate input light pulses, and diffuser-free speckle reduction optics that include a beam splitter, for splitting an input light pulse from the light source into multiple light pulses that are oriented at angles in relation to each other when exiting the beam splitter, and at least one optical element for directing the multiple light pulses to impinge on an inspected object at different angles.

Inspection method and an inspection system exhibiting speckle reduction characteristics

An inspection system includes a first focusing unit configured to perform fast focus changes to a first focusing function applied to an incident light beam. A traveling lens acousto-optic device is arranged to receive the light beam focused by the first focusing function and produce focused spots using a plurality of traveling lenses generated in response to radio frequency signals. The traveling lenses apply a second focusing function and the traveling lens acousto-optic device is arranged to alter the second focusing function at a fast rate. The inspection system also includes optics arranged to direct the focused spots onto an inspected object and to direct radiation from the inspected object to a sensor.

Inspection system and method for fast changes of focus

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Nof-Ayalon, Israel

Haim Feldman