Samsung Electronics Co., Ltd.

Hahn Park

Sung Wook Jung

Yong Won Choi

Kang-Min Park

Jae Chul Hwang

MinYoung Hwang

Sung Baek Kim

Heokjae Lee

Se Un Park

Yongjoon Hong

Jae Boo Kim

Dongil Yoon

Woo Jin Park

A removal apparatus for removing residual gases and a substrate treating facility for removing residual gases is disclosed. The residual gas removal apparatus includes a housing, a gas supply for providing a non-reactive gas into the housing, a supporting member provided to support a substrate and positioned in the housing, a heat radiating member spaced apart from the supporting member and positioned in the housing, and a heating unit for providing heat toward the supporting member and positioned between the heat radiating member and the supporting member.

Removal apparatus for removing residual gas and substrate treating facility including the same

An industrial gripper includes a base plate, at least three finger units to be moved relative to the base plate, a supporting unit to support the finger units, a first drive unit coupled to the supporting unit to allow simultaneous angular displacement of the finger units toward an object, and a second drive unit coupled to the supporting unit to adjust orientation angles between the finger units. Each of the finger units includes an intermediation member to be moved in a first direction by the first drive unit, a grip member to grip the object by being moved in a second direction different from the first direction as a movement direction of the intermediation member, and a connection member to convert the first direction movement of the intermediation member into the second direction movement of the grip member.

Industrial gripper with multiple degrees of freedom

Growing community of inventors

Seoul, South Korea

Hahn Park