Industry-university Cooperation Foundation Hanyang University

Soongsil University

Haejung Hwang

Do Hwan Kim

Moon Sung Kang

Han Wool Park

Ji Hye Shin

Hojin Lee

Keun-Yeong Choi

Disclosed are an organic semiconductor compound that exhibits chemical resistance and etch resistance while maintaining electrical characteristics and thus is applicable to an existing photolithography process, thereby increasing process efficiency, and an organic semiconductor device using the same.

Compound of organic semiconductor and organic semiconductor device using the same

According to embodiments of the present invention, a method of manufacturing an organic semiconductor device includes forming a first organic semiconductor layer on a substrate, and forming a self-assembled monolayer by providing a self-assembly precursor onto the first organic semiconductor layer. The first organic semiconductor layer has a reactive group on a top surface of the first organic semiconductor layer. The forming of the self-assembled monolayer includes forming a chemical bond between the self-assembly precursor and the reactive group of the first organic semiconductor layer.

Method of manufacturing organic semiconductor device

Growing community of inventors

Seoul, South Korea

Haejung Hwang