Semes Co., Ltd.

Samsung Electronics Co., Ltd.

Lg Energy Solution, Ltd.

Hae Won Choi

Ji Hwan Park

Ki Hoon Choi

Seung Min Shin

Pil Kyun Heo

Anton Koriakin

Kun Tack Lee

Young Bum Cho

Chan Young Heo

Sang Jin Park

Jin Oh Yang

Do Heon Kim

Joon Ho Won

Jin Yeong Sung

Jang Jin Lee

Sung Kyu Park

Jae Seong Lee

Ji Soo Jeon

Koriakin Anton

A method of manufacturing a battery module may prevent chain ignition. The method may include preparing a module case having a plurality of receiving portions formed therein, each of the receiving portions having a space of a predetermined size; disposing a respective battery cell among a plurality battery cells in each of the receiving portions; and heating the module case with the battery cells to a predetermined temperature to fix the battery cells in the respective receiving portions of the module case. The module case comprises a lower plate, a plurality of side plates, and a plurality of partition walls configured to form the receiving portions, and each of the partition walls comprises a lower partition wall extending from the lower plate by a predetermined height and an upper partition wall extending from the lower partition wall by a predetermined height.

Method of manufacturing battery module capable of preventing chain ignition

An apparatus and method for treating a substrate are provided. The apparatus includes at least one first process chamber configured to supply a developer onto the substrate; at least one second process chamber configured to treat the substrate using a supercritical fluid; a transfer chamber configured to transfer the substrate from the at least one first process chamber to the at least one second process chamber, while the developer supplied in the at least one first process chamber remains on the substrate; and a temperature and humidity control system configured to manage temperature and humidity of the transfer chamber by supplying a first gas of constant temperature and humidity into the transfer chamber.

Apparatus and method for treating substrate including process chambers and transfer chamber

A supercritical processing apparatus includes an upper vessel including a first fluid hole formed in a center thereof, and a lower vessel including a second fluid hole formed in a center thereof. A space is defined between the upper and lower vessels and configured to allow a substrate to be placed therein. The upper vessel further includes a first guide portion provided at a lower portion thereof to be gradually inclined downward toward a periphery thereof from the first fluid hole.

Supercritical processing apparatus

Growing community of inventors

Daejeon, South Korea

Hae Won Choi