Semes Co., Ltd.

Lg Energy Solution, Ltd.

Samsung Electronics Co., Ltd.

Sungkyunkwan University

Hae-Won Choi

Anton Koriakin

Kihoon Choi

Jaeseong Lee

Jin-Oh Yang

In-Hyuk Jung

Kwang-Keun Oh

Chan Young Heo

Ki-Moon Kang

Do Heon Kim

Ji Soo Jeong

Kuntack Lee

Young-Hoo Kim

Sangjine Park

Jihoon Jeong

Ki Hoon Choi

Pil Kyun Heo

Seohyun Kim

Joon Ho Won

Eung Su Kim

Jin Yeong Sung

Min Woo Kim

Jeong Ho Cho

Sukhoon Kim

Keonyoung Kim

Tae Hee Kim

Hyungseok Kang

Yerim Yeon

Youngran Ko

Jang Jin Lee

Hong Gi Min

In Il Jung

Kwon Taek Lim

Sang Ho Lee

Yong Hun Kim

Discussed is a battery pack, including a plurality of battery cells, and a side structure unit configured to accommodate a cooling unit and the plurality of battery cells and configured to form a first section of an outer surface of the battery pack. The side structure unit includes a main plate formed to have a predetermined length along the longitudinal direction of the battery pack, and accommodates a first group of the plurality battery cells at a first side and a second group of the plurality of battery cells at a second side that is opposite to the first side, and each of the first side and the second side of the main plate includes a plurality of inter-wings that separate the plurality of battery cells.

Battery pack and vehicle including the same

Guide for battery

The inventive concept provides a method for treating a substrate. The method for treating a substrate comprises: a pressurization step for increasing a pressure of an inner space of a chamber by supplying a treating fluid to the inner space, after taking the substrate into the inner space; a flow step for generating a flow of the treating fluid by combination of supplying and discharging the treating fluid to and from the inner space; and a depressurization step of decreasing the pressure of the inner space by discharging the treating fluid from the inner space, and wherein the pressurization step comprises: a bottom side supply process for increasing the pressure of the inner space by supplying the treating fluid to a backside of the substrate taken into the inner space; and a top side supply process of increasing the pressure of the inner space by supplying the treating fluid to a top side of the substrate taken into the inner space.

Method and apparatus for treating a substrate

Discussed is a battery pack that can include a battery cell assembly including a plurality of battery cells, a busbar assembly on one side of the battery cell assembly, a cooling unit between the plurality of battery cells, and a cell accommodation unit configured to partition the plurality of battery cells together with the cooling unit.

Battery pack and vehicle comprising same

Cooling plate for battery

Bus bar for battery

Bus bar unit for battery

A substrate processing apparatus includes a chamber including an upper chamber and a lower chamber coupled to each other to provide a space for processing a substrate, a substrate support configured to support the substrate within the chamber, an upper supply port provided in the upper chamber and configured to supply a supercritical fluid on an upper surface of the substrate within the chamber, a recess provided in a lower surface of the upper chamber, the recess including a horizontal extension portion extending in a direction parallel with the upper surface of the substrate in a radial direction from an outlet of the upper supply port and an inclined extension portion extending obliquely at an angle from the horizontal extension portion, and a baffle member disposed within the recess between the upper supply port and the substrate.

Substrate processing apparatus and substrate processing method

In a substrate processing method, a rinse process using a rinse solution is performed on a development-processed photoresist pattern on a substrate. A substitution process including a first substitution step using a mixed solution of a non-polar organic solvent and a surfactant and a second substitution step using the non-polar organic solvent is performed on the substrate. The substitution process is performed a plurality of times until the rinse solution remaining on the substrate is less than a predetermined value. A supercritical fluid drying process is performed on the substrate to dry the non-polar organic solvent remaining on the substrate.

Substrate processing method and substrate processing system

A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus includes a first process chamber to apply an organic solvent to a substrate applied with a developer and introduced, and a second process chamber to treat the substrate applied with the organic solvent and introduced, through a supercritical fluid.

Substrate treating apparatus and substrate treating method

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having a treating space therein; a supply line having a first open/close valve installed thereon and configured to supply a treating fluid to the treating space; a heater installed on the supply line and configured to heat the treating fluid; an exhaust line having a second open/close valve installed thereon and configured to exhaust the treating space; and, a controller configured to control the first open/close value and the second open/close valve such that the treating fluid heated is supplied to and exhausted from the treating space before a treating process is performed on a substrate in the treating space.

Apparatus and method for treating substrate

A composition for cleaning a substrate is provided. According to an embodiment, the composition for cleaning the substrate includes an organic solvent having a Hansen solubility parameter of 5 or more to 12 or less for polystyrene latex to the substrate.

Substrate cleaning compositions, substrate cleaning method and substrate treating apparatus

An apparatus for processing a substrate includes a chamber having a processing space inside, a substrate support unit that supports the substrate in the processing space, and a temperature adjustment unit that is installed in the chamber and that adjusts temperature in the processing space. The temperature adjustment unit includes a heating member that heats the processing space and a cooling member that cools the processing space. The cooling member is located closer to a central axis of the chamber than the heating member.

Apparatus for processing substrate including cooling member closer to central axis than heating member

Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The anhydrous substrate cleaning composition includes an etching composite that provides fluorine, a solvent that dissolves the etching composite, and a binder that is a composite including phosphorous.

Substrate cleaning composition, substrate treating method, and substrate treating apparatus

Disclosed are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus includes a first process chamber configured to supply a development liquid to a substrate that is carried into the first process chamber after an exposure process is performed on the substrate, a second process chamber configured to treat the substrate through a supercritical fluid, a feeding robot configured to transfer the substrate from the first process chamber to the second process chamber, and a controller configured to control the feeding robot such that the substrate is transferred to the second process chamber in a state in which the development liquid supplied by the first process chamber resides in the substrate.

Growing community of inventors

Daejeon, South Korea

Hae-Won Choi