Samsung Electronics Co., Ltd.

Hadong Jin

Seungbo Shim

Sungyeol Kim

Dougyong Sung

Sungyong Lim

Donghyeon Na

Minyoung Hur

Namkyun Kim

Hyosin Kim

Siyoung Koh

An apparatus for providing radio frequency (RF) power includes a load having a process chamber, a RF power generator configured to provide the RF power through a cable electrically connected to the load, and a reflected power controller configured to detect reflected power from the load in a delivery mode and configured to control the RF power according to the reflected power that was detected.

Apparatus for providing RF power and operating method thereof

A plasma control apparatus for controlling plasma to be uniformly distributed in a plasma chamber and a plasma processing system including the same are provided. The plasma control apparatus includes a transmission line configured to deliver radio frequency (RF) power to a plasma chamber through at least two frequencies, a matching circuit configured to control impedance for maximum delivery of the RF power, and a plasma control circuit configured to selectively and independently control harmonics at a very high frequency (VHF) among the at least two frequencies and to control plasma distribution in the plasma chamber by producing resonance for the harmonics.

Plasma control apparatus and plasma processing system including the same

Growing community of inventors

Hwaseong-si, South Korea

Hadong Jin