Samsung Electronics Co., Ltd.

Ha-Neul Lee

Ui Kun Kwon

Jaechun Lee

Jongwook Lee

Changmok Choi

Jong-Sub Lee

Kyoung-Ha Eom

Sang-Gyo Chung

An exercise feedback provision apparatus includes an acquirer configured to acquire exercise intensity information including either one or both of user biometric information and user movement information, and a controller configured to verify whether the exercise intensity information is in a predetermined range, and generate a control signal based on a result of the verifying. The apparatus further includes a feedback provider configured to output a tactile feedback based on a pattern corresponding to the control signal.

Exercise feedback provision apparatus and method

A method of forming fine patterns of semiconductor devices is disclosed. The method comprises forming a hard mask layer on an etch target, which includes first and second regions. The hard mask layer may further have first and second preliminary mask patterns formed on the same. Furthermore, a spacer layer may be formed on the first and second preliminary mask patterns. The spacer layer and the first and second preliminary mask patterns may be partially removed to form first and second spacers on sidewalls of the first and second preliminary mask patterns, respectively. The second spacer in the second region may have a top surface higher than a top surface of the first spacer in the first region. The height differences between the spacers allow forming of first and second patterns in the first and second regions, and thereby forming fine patterns of semiconductor devices.

Methods of forming patterns of a semiconductor devices

Growing community of inventors

Seoul, South Korea

Ha-Neul Lee