Asml Netherlands B.v.

Güneş Nakiboglu

Richard Johannes Franciscus Van Haren

Frank Johannes Jacobus Van Boxtel

Hakki Ergün Cekli

Christianus Wilhelmus Johannes Berendsen

Daan Daniel Johannes Antonius Van Sommeren

Jean-Philippe Xavier Van Damme

Gijsbert Rispens

Johan Franciscus Maria Beckers

Remco Yuri Van De Moesdijk

Dries Vaast Paul Hemschoote

Theodorus Johannes Antonius Renckens

An apparatus, which may form part of a lithographic apparatus, comprises a substrate table, a projection system, a gas lock and a gas flow guide. The substrate table is suitable for supporting a substrate. The projection system has a body which defines an interior and an opening. The projection system is configured and arranged to project a radiation beam through the opening onto a substrate supported by the substrate table. The gas lock is suitable for providing a gas flow from the opening away from the interior. The gas flow guide is configured to guide at least a portion of the gas flow away from the substrate supported by the substrate table.

Apparatus incorporating a gas lock

A method of processing a substrate includes: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing at least part of the photosensitive material from around an outer edge of the layer of photosensitive material so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate.

Method for removing photosensitive material on a substrate

A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system has: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.

Patterning device cooling system and method of thermally conditioning a patterning device

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Eindhoven, Netherlands

Güneş Nakiboglu