Cadence Design Systems, Inc.

Invarium, Inc.

Gökhan Perçin

Franz X Zach

Abdurrahman Sezginer

Ram S Ramanujam

A test mask with both verification structures and calibration structures is provided to enable the formation of an image of at least one verification structure and at least one calibration structure at a plurality of different test site locations under different dose and defocus conditions to allow the calibration structures to be measured and to obtain at least one computational model for optical proximity correction purposes.

Method for verifying and choosing lithography model

An apparatus and method for characterizing an illumination pupil of an exposure tool comprises forming a plurality of pinhole test patterns at a plurality of test site locations to facilitate locating test pattern edges for extracting therefrom the illumination pupil characteristics of the exposure tool.

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Los Gatos, CA, United States of America

Gökhan Perçin