Commissariat a L'energie Atomique

Stmicroelectronics Gmbh

Stmicroelectronics S.a.

Commissariat &#xc0; L'&#xc9;nergie Atomique Et Aux &#xc9;nergies Alternatives

Stmicroelectronics (rousset) Sas

Gérard Passemard

Sylvain Maitrejean

Valentina Ivanova-Hristova

Charles Lecornec

Emmanuel Sicurani

A method for forming a nanotube/nanofiber growth catalyst on the sides of portions of a layer of a first material, comprising the steps of depositing a thin layer of a second material; opening this layer at given locations; depositing a very thin catalyst layer; depositing a layer of the first material over a thickness greater than that of the layer of the second material; eliminating by chem./mech. polishing the upper portion of the structure up to the high level of the layer of the second material; and eliminating the second material facing selected sides of the layer portions of the first material.

Horizontal nanotube/nanofiber growth method

The process includes depositing a filling material in trenches formed in at least one layer of dielectric so as to fill open pores in the dielectric. The filling material is intended to prevent the subsequent diffusion of the interconnect metal and/or of a metal of a diffusion barrier, and may be non-porous. The filling material preferably has a low dielectric constant.

Process for fabricating interconnect networks

Growing community of inventors

Bilieu, France

Gérard Passemard